Stable Silicene in Graphene/Silicene Van der Waals Heterostructures
Abstract
Silicene-based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I–V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior.
- Authors:
-
- Chinese Academy of Sciences (CAS), Beijing (China); Univ. of Maryland, College Park, MD (United States)
- Chinese Academy of Sciences (CAS), Beijing (China)
- Chinese Academy of Sciences (CAS), Beijing (China); Vanderbilt Univ., Nashville, TN (United States)
- Univ. of Maryland, College Park, MD (United States)
- Vanderbilt Univ., Nashville, TN (United States)
- Publication Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States). National Energy Research Scientific Computing Center (NERSC); Univ. of California, Oakland, CA (United States); Vanderbilt Univ., Nashville, TN (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES). Scientific User Facilities Division
- OSTI Identifier:
- 1543460
- Alternate Identifier(s):
- OSTI ID: 1479546; OSTI ID: 1597916
- Grant/Contract Number:
- AC02-05CH11231; FG02-09ER46554; DE‐FG02‐09ER46554; DE‐AC02‐05CH11231
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Advanced Materials
- Additional Journal Information:
- Journal Volume: 30; Journal Issue: 49; Journal ID: ISSN 0935-9648
- Publisher:
- Wiley
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE; Chemistry; Science & Technology - Other Topics; Materials Science; Physics
Citation Formats
Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., and Gao, Hong-Jun. Stable Silicene in Graphene/Silicene Van der Waals Heterostructures. United States: N. p., 2018.
Web. doi:10.1002/adma.201804650.
Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., & Gao, Hong-Jun. Stable Silicene in Graphene/Silicene Van der Waals Heterostructures. United States. https://doi.org/10.1002/adma.201804650
Li, Geng, Zhang, Lizhi, Xu, Wenyan, Pan, Jinbo, Song, Shiru, Zhang, Yi, Zhou, Haitao, Wang, Yeliang, Bao, Lihong, Zhang, Yu-Yang, Du, Shixuan, Ouyang, Min, Pantelides, Sokrates T., and Gao, Hong-Jun. Mon .
"Stable Silicene in Graphene/Silicene Van der Waals Heterostructures". United States. https://doi.org/10.1002/adma.201804650. https://www.osti.gov/servlets/purl/1543460.
@article{osti_1543460,
title = {Stable Silicene in Graphene/Silicene Van der Waals Heterostructures},
author = {Li, Geng and Zhang, Lizhi and Xu, Wenyan and Pan, Jinbo and Song, Shiru and Zhang, Yi and Zhou, Haitao and Wang, Yeliang and Bao, Lihong and Zhang, Yu-Yang and Du, Shixuan and Ouyang, Min and Pantelides, Sokrates T. and Gao, Hong-Jun},
abstractNote = {Silicene-based van der Waals heterostructures are theoretically predicted to have interesting physical properties, but their experimental fabrication has remained a challenge because of the easy oxidation of silicene in air. Here, the fabrication of graphene/silicene van der Waals heterostructures by silicon intercalation is reported. Density functional theory calculations show weak interactions between graphene and silicene layers, confirming the formation of van der Waals heterostructures. The heterostructures show no observable damage after air exposure for extended periods, indicating good air stability. The I–V characteristics of the vertical graphene/silicene/Ru heterostructures show rectification behavior.},
doi = {10.1002/adma.201804650},
journal = {Advanced Materials},
number = 49,
volume = 30,
place = {United States},
year = {Mon Oct 08 00:00:00 EDT 2018},
month = {Mon Oct 08 00:00:00 EDT 2018}
}
Web of Science
Figures / Tables:
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