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Title: Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics

Authors:
ORCiD logo [1] ;  [1] ;  [2] ;  [2] ;  [3] ;  [2] ;  [2] ;  [1] ;  [2] ;  [2] ;  [3] ;  [2] ;  [1]
  1. Department of Chemical Engineering, Stanford University, Stanford CA 94305 USA
  2. Department of Materials Science and Engineering, Stanford University, Stanford CA 94305 USA
  3. Department of Electrical Engineering and Computer Science, Massachusetts Institute of Technology, Cambridge MA 02142 USA
Publication Date:
Grant/Contract Number:
EE0008154
Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Energy Materials
Additional Journal Information:
Journal Name: Advanced Energy Materials Journal Volume: 8 Journal Issue: 23; Journal ID: ISSN 1614-6832
Publisher:
Wiley Blackwell (John Wiley & Sons)
Sponsoring Org:
USDOE
Country of Publication:
Germany
Language:
English
OSTI Identifier:
1457065

Palmstrom, Axel F., Raiford, James A., Prasanna, Rohit, Bush, Kevin A., Sponseller, Melany, Cheacharoen, Rongrong, Minichetti, Maxmillian C., Bergsman, David S., Leijtens, Tomas, Wang, Hsin-Ping, Bulović, Vladimir, McGehee, Michael D., and Bent, Stacey F.. Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics. Germany: N. p., Web. doi:10.1002/aenm.201800591.
Palmstrom, Axel F., Raiford, James A., Prasanna, Rohit, Bush, Kevin A., Sponseller, Melany, Cheacharoen, Rongrong, Minichetti, Maxmillian C., Bergsman, David S., Leijtens, Tomas, Wang, Hsin-Ping, Bulović, Vladimir, McGehee, Michael D., & Bent, Stacey F.. Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics. Germany. doi:10.1002/aenm.201800591.
Palmstrom, Axel F., Raiford, James A., Prasanna, Rohit, Bush, Kevin A., Sponseller, Melany, Cheacharoen, Rongrong, Minichetti, Maxmillian C., Bergsman, David S., Leijtens, Tomas, Wang, Hsin-Ping, Bulović, Vladimir, McGehee, Michael D., and Bent, Stacey F.. 2018. "Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics". Germany. doi:10.1002/aenm.201800591.
@article{osti_1457065,
title = {Interfacial Effects of Tin Oxide Atomic Layer Deposition in Metal Halide Perovskite Photovoltaics},
author = {Palmstrom, Axel F. and Raiford, James A. and Prasanna, Rohit and Bush, Kevin A. and Sponseller, Melany and Cheacharoen, Rongrong and Minichetti, Maxmillian C. and Bergsman, David S. and Leijtens, Tomas and Wang, Hsin-Ping and Bulović, Vladimir and McGehee, Michael D. and Bent, Stacey F.},
abstractNote = {},
doi = {10.1002/aenm.201800591},
journal = {Advanced Energy Materials},
number = 23,
volume = 8,
place = {Germany},
year = {2018},
month = {6}
}

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