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Title: Oxidant K edge x-ray emission spectroscopy of UF4 and UO2

Authors:
 [1];  [2];  [3];  [3];  [3]
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  1. Univ. of Wisconsin, Oshkosh, WI (United States). Dept. of Physics and Astronomy
  2. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  3. Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States)
Publication Date:
Research Org.:
Lawrence Berkeley National Lab. (LBNL), Berkeley, CA (United States); Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States); Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE Office of Science (SC), Basic Energy Sciences (BES). Chemical Sciences, Geosciences, and Biosciences Division
OSTI Identifier:
1435130
Alternate Identifier(s):
OSTI ID: 1418862; OSTI ID: 1458631
Report Number(s):
LLNL-JRNL-742730
Journal ID: ISSN 0734-2101; ark:/13030/qt3q7977vp; TRN: US1802701
Grant/Contract Number:  
AC02-05CH11231; AC52-07NA27344
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films
Additional Journal Information:
Journal Volume: 36; Journal Issue: 3; Journal ID: ISSN 0734-2101
Publisher:
American Vacuum Society
Country of Publication:
United States
Language:
English
Subject:
46 INSTRUMENTATION RELATED TO NUCLEAR SCIENCE AND TECHNOLOGY; 73 NUCLEAR PHYSICS AND RADIATION PHYSICS; emission spectroscopy; x-ray photoelectron spectroscopy; chemical compounds; nuclear fuel; biotechnology; classical electromagnetism; Materials science

Citation Formats

Tobin, J. G., Yu, S. -W., Qiao, R., Yang, W. L., and Shuh, D. K.. Oxidant K edge x-ray emission spectroscopy of UF4 and UO2. United States: N. p., 2018. Web. doi:10.1116/1.5016393.
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Tobin, J. G., Yu, S. -W., Qiao, R., Yang, W. L., & Shuh, D. K.. Oxidant K edge x-ray emission spectroscopy of UF4 and UO2. United States. https://doi.org/10.1116/1.5016393
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Tobin, J. G., Yu, S. -W., Qiao, R., Yang, W. L., and Shuh, D. K.. Wed . "Oxidant K edge x-ray emission spectroscopy of UF4 and UO2". United States. https://doi.org/10.1116/1.5016393. https://www.osti.gov/servlets/purl/1435130.
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@article{osti_1435130,
title = {Oxidant K edge x-ray emission spectroscopy of UF4 and UO2},
author = {Tobin, J. G. and Yu, S. -W. and Qiao, R. and Yang, W. L. and Shuh, D. K.},
abstractNote = {},
doi = {10.1116/1.5016393},
journal = {Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films},
number = 3,
volume = 36,
place = {United States},
year = {2018},
month = {1}
}
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Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1116/1.5016393
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Citation Metrics:
Cited by: 1 work
Citation information provided by
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Figures / Tables:

Figure 1 Figure 1: Comparison of the XES results for UF4 with the X-ray Photoelectron Spectroscopy (XPS) of UF4 from Thibaut et al. and the ODOS derived from the calculations of Ryzhkov, for a (UF8)4- cluster. The XES peak is at hv = 675 eV. The XPS measurements of Teterin et al.more » confirm the Thibaut result.« less
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