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Title: 355-nm, nanosecond laser mirror thin film damage competition

Abstract

Here, this competition aimed to survey state-of-the-art UV high reflectors. The requirements of the coatings are a minimum reflection of 99.5% at 45 degrees incidence angle for P-polarized light at 355-nm. The choice of coating materials, design, and deposition method were left to the participants. Laser damage testing was performed at a single testing facility using the raster scan method with a 5-ns pulse length laser system operating at 10 Hz in a single longitudinal mode. A double blind test assured sample and submitter anonymity. Finally, in addition to the laser damage resistance results, details of the deposition processes, cleaning method, coating materials and layer count are also shared.

Authors:
 [1];  [1];  [2];  [2]
  1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. Spica Technologies, Inc., Hollis, NH (United States)
Publication Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1424107
Report Number(s):
LLNL-JRNL-742147
Grant/Contract Number:  
AC52-07NA27344
Resource Type:
Accepted Manuscript
Journal Name:
SPIE Proceedings
Additional Journal Information:
Journal Volume: 10447; Conference: SPIE Laser Damage, Boulder, CO (United States), 2017
Country of Publication:
United States
Language:
English
Subject:
42 ENGINEERING; 36 MATERIALS SCIENCE; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; laser damage resistance; laser damage testing; thin film; multilayer; dielectric coating; nanosecond pulse length; UV reflector

Citation Formats

Negres, Raluca A., Stolz, Christopher J., Thomas, Michael D., and Caputo, Mark. 355-nm, nanosecond laser mirror thin film damage competition. United States: N. p., 2017. Web. doi:10.1117/12.2279981.
Negres, Raluca A., Stolz, Christopher J., Thomas, Michael D., & Caputo, Mark. 355-nm, nanosecond laser mirror thin film damage competition. United States. doi:10.1117/12.2279981.
Negres, Raluca A., Stolz, Christopher J., Thomas, Michael D., and Caputo, Mark. Thu . "355-nm, nanosecond laser mirror thin film damage competition". United States. doi:10.1117/12.2279981. https://www.osti.gov/servlets/purl/1424107.
@article{osti_1424107,
title = {355-nm, nanosecond laser mirror thin film damage competition},
author = {Negres, Raluca A. and Stolz, Christopher J. and Thomas, Michael D. and Caputo, Mark},
abstractNote = {Here, this competition aimed to survey state-of-the-art UV high reflectors. The requirements of the coatings are a minimum reflection of 99.5% at 45 degrees incidence angle for P-polarized light at 355-nm. The choice of coating materials, design, and deposition method were left to the participants. Laser damage testing was performed at a single testing facility using the raster scan method with a 5-ns pulse length laser system operating at 10 Hz in a single longitudinal mode. A double blind test assured sample and submitter anonymity. Finally, in addition to the laser damage resistance results, details of the deposition processes, cleaning method, coating materials and layer count are also shared.},
doi = {10.1117/12.2279981},
journal = {SPIE Proceedings},
number = ,
volume = 10447,
place = {United States},
year = {2017},
month = {11}
}

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Works referenced in this record:

Study of Al2O3/MgF2 HR coatings at 355nm
journal, July 2005


Laser-damage threshold of Sc2O3/SiO2 high reflector coatings for a laser wavelength of 355 nm
journal, May 1993


Overcoat dependence of laser-induced damage threshold of 355nm HR coatings
journal, January 2006