Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films

Barmak, Katayun; Liu, Jiaxing

doi:10.1116/1.5003628

Title: Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films

Authors:

Barmak, Katayun ^[1]; Liu, Jiaxing ^[1]

Department of Applied Physics and Applied Mathematics, Columbia University, New York, New York 10027

Publication Date:: Wed Nov 01 00:00:00 EDT 2017

Sponsoring Org.:: USDOE

OSTI Identifier:: 1420471

Grant/Contract Number:: SC0012704

Resource Type:: Publisher's Accepted Manuscript

Journal Name:: Journal of Vacuum Science and Technology A

Additional Journal Information:: Journal Name: Journal of Vacuum Science and Technology A Journal Volume: 35 Journal Issue: 6; Journal ID: ISSN 0734-2101

Publisher:: American Vacuum Society

Country of Publication:: United States

Language:: English

Citation Formats


                    Barmak, Katayun, and Liu, Jiaxing. Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films.  United States: N. p., 2017. 
Web.  doi:10.1116/1.5003628.

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                    Barmak, Katayun, & Liu, Jiaxing. Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films.  United States.  https://doi.org/10.1116/1.5003628

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                    Barmak, Katayun, and Liu, Jiaxing. Wed .  
"Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films".  United States.  https://doi.org/10.1116/1.5003628.

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@article{osti_1420471,

  title        = {Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films},

  author       = {Barmak, Katayun and Liu, Jiaxing},

  abstractNote = {},

  doi          = {10.1116/1.5003628},

  journal      = {Journal of Vacuum Science and Technology A},

  number       = 6,

  volume       = 35,

  place        = {United States},

  year         = {Wed Nov 01 00:00:00 EDT 2017},

  month        = {Wed Nov 01 00:00:00 EDT 2017}

}

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Works referenced in this record:

Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputtering
journal, June 1973

Petroff, P.; Sheng, T. T.; Sinha, A. K.
Journal of Applied Physics, Vol. 44, Issue 6
DOI: 10.1063/1.1662611

Current-induced spin orientation of electrons in semiconductors
journal, July 1971

Dyakonov, M. I.; Perel, V. I.
Physics Letters A, Vol. 35, Issue 6
DOI: 10.1016/0375-9601(71)90196-4

Sputter-deposited amorphous-like tungsten
journal, March 2004

Radić, N.; Tonejc, A.; Ivkov, J.
Surface and Coatings Technology, Vol. 180-181
DOI: 10.1016/j.surfcoat.2003.10.038

Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films
journal, September 2011

Choi, Dooho; Wang, Bincheng; Chung, Suk
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 29, Issue 5
DOI: 10.1116/1.3622619

Structure and stability of sputter deposited beta‐tungsten thin films
journal, June 1994

Weerasekera, I. A.; Shah, S. Ismat; Baxter, David V.
Applied Physics Letters, Vol. 64, Issue 24
DOI: 10.1063/1.111318

Topologically close-packed phases: Deposition and formation mechanism of metastable β-W in thin films
journal, February 2016

Liu, Jiaxing; Barmak, Katayun
Acta Materialia, Vol. 104
DOI: 10.1016/j.actamat.2015.11.049

Growth and characterization of α and β -phase tungsten films on various substrates
journal, March 2016

Lee, Jeong-Seop; Cho, Jaehun; You, Chun-Yeol
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 34, Issue 2
DOI: 10.1116/1.4936261

Beta (β) tungsten thin films: Structure, electron transport, and giant spin Hall effect
journal, May 2015

Hao, Qiang; Chen, Wenzhe; Xiao, Gang
Applied Physics Letters, Vol. 106, Issue 18
DOI: 10.1063/1.4919867

Spin transfer torque devices utilizing the giant spin Hall effect of tungsten
journal, September 2012

Pai, Chi-Feng; Liu, Luqiao; Li, Y.
Applied Physics Letters, Vol. 101, Issue 12
DOI: 10.1063/1.4753947

Structure and morphological study of nanometer W and W3O thin films
journal, March 2003

Maillé, L.; Sant, C.; Le Paven-Thivet, C.
Thin Solid Films, Vol. 428, Issue 1-2
DOI: 10.1016/S0040-6090(02)01277-4

XRD line profile analysis of tungsten thin films
journal, October 2005

Djerdj, I.; Tonejc, A. M.; Tonejc, A.
Vacuum, Vol. 80, Issue 1-3
DOI: 10.1016/j.vacuum.2005.08.017

Influence of microstructure on residual stress in tungsten thin films analyzed by X-ray diffraction
journal, April 1996

Durand, N.; Badawi, K. F.; Goudeau, Ph.
Thin Solid Films, Vol. 275, Issue 1-2
DOI: 10.1016/0040-6090(96)80096-4

Phase transformation of thin sputter-deposited tungsten films at room temperature
journal, January 2002

Rossnagel, S. M.; Noyan, I. C.; Cabral, C.
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 20, Issue 5
DOI: 10.1116/1.1506905

Transformation of topologically close-packed β-W to body-centered cubic α-W: Comparison of experiments and computations
journal, October 2017

Barmak, Katayun; Liu, Jiaxing; Harlan, Liam
The Journal of Chemical Physics, Vol. 147, Issue 15
DOI: 10.1063/1.4995261

β-phase tungsten nanorod formation by oblique-angle sputter deposition
journal, October 2003

Karabacak, Tansel; Mallikarjunan, Anupama; Singh, Jitendra P.
Applied Physics Letters, Vol. 83, Issue 15
DOI: 10.1063/1.1618944

Inhomogeneous strain states in sputter deposited tungsten thin films
journal, November 1997

Noyan, I. C.; Shaw, T. M.; Goldsmith, C. C.
Journal of Applied Physics, Vol. 82, Issue 9
DOI: 10.1063/1.366237

Stresses in sputtered tungsten thin films
journal, September 1989

Haghiri-Gosnet, A. M.; Ladan, F. R.; Mayeux, C.
Applied Surface Science, Vol. 38, Issue 1-4
DOI: 10.1016/0169-4332(89)90550-3

Annealing effects on the structural and electrical properties of sputtered tungsten thin films
journal, November 2016

Kaidatzis, Andreas; Psycharis, Vassilios; Mergia, Konstantina
Thin Solid Films, Vol. 619
DOI: 10.1016/j.tsf.2016.10.027

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Similar Records

Title: Impact of deposition rate, underlayers, and substrates on β-tungsten formation in sputter deposited films

Citation Formats

Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputtering journal, June 1973

Current-induced spin orientation of electrons in semiconductors journal, July 1971

Sputter-deposited amorphous-like tungsten journal, March 2004

Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films journal, September 2011

Structure and stability of sputter deposited beta‐tungsten thin films journal, June 1994

Topologically close-packed phases: Deposition and formation mechanism of metastable β-W in thin films journal, February 2016

Growth and characterization of α and β -phase tungsten films on various substrates journal, March 2016

Beta (β) tungsten thin films: Structure, electron transport, and giant spin Hall effect journal, May 2015

Spin transfer torque devices utilizing the giant spin Hall effect of tungsten journal, September 2012

Structure and morphological study of nanometer W and W3O thin films journal, March 2003

XRD line profile analysis of tungsten thin films journal, October 2005

Influence of microstructure on residual stress in tungsten thin films analyzed by X-ray diffraction journal, April 1996

Phase transformation of thin sputter-deposited tungsten films at room temperature journal, January 2002

Transformation of topologically close-packed β-W to body-centered cubic α-W: Comparison of experiments and computations journal, October 2017

β-phase tungsten nanorod formation by oblique-angle sputter deposition journal, October 2003

Inhomogeneous strain states in sputter deposited tungsten thin films journal, November 1997

Stresses in sputtered tungsten thin films journal, September 1989

Annealing effects on the structural and electrical properties of sputtered tungsten thin films journal, November 2016

Microstructure, growth, resistivity, and stresses in thin tungsten films deposited by rf sputtering
journal, June 1973

Current-induced spin orientation of electrons in semiconductors
journal, July 1971

Sputter-deposited amorphous-like tungsten
journal, March 2004

Phase, grain structure, stress, and resistivity of sputter-deposited tungsten films
journal, September 2011

Structure and stability of sputter deposited beta‐tungsten thin films
journal, June 1994

Topologically close-packed phases: Deposition and formation mechanism of metastable β-W in thin films
journal, February 2016

Growth and characterization of α and β -phase tungsten films on various substrates
journal, March 2016

Beta (β) tungsten thin films: Structure, electron transport, and giant spin Hall effect
journal, May 2015

Spin transfer torque devices utilizing the giant spin Hall effect of tungsten
journal, September 2012

Structure and morphological study of nanometer W and W3O thin films
journal, March 2003

XRD line profile analysis of tungsten thin films
journal, October 2005

Influence of microstructure on residual stress in tungsten thin films analyzed by X-ray diffraction
journal, April 1996

Phase transformation of thin sputter-deposited tungsten films at room temperature
journal, January 2002

Transformation of topologically close-packed β-W to body-centered cubic α-W: Comparison of experiments and computations
journal, October 2017

β-phase tungsten nanorod formation by oblique-angle sputter deposition
journal, October 2003

Inhomogeneous strain states in sputter deposited tungsten thin films
journal, November 1997

Stresses in sputtered tungsten thin films
journal, September 1989

Annealing effects on the structural and electrical properties of sputtered tungsten thin films
journal, November 2016