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Title: A Lithography-Free and Field-Programmable Photonic Metacanvas

Authors:
 [1];  [2];  [3];  [4];  [4];  [3];  [5];  [6];  [3];  [7];  [8];  [9];  [4];  [6];  [7]; ORCiD logo [7]
  1. Department of Materials Science and Engineering, University of California, Berkeley CA 94720 USA, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley CA 94720 USA, State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing 100084 P. R. China
  2. Department of Mechanical Engineering, University of California, Berkeley CA 94720 USA, Department of Mechanical Engineering, Hanyang University, 55 Hanyangdaehak-ro Sangnok-gu, Ansan Gyeonggi-do 15588 Republic of Korea
  3. Department of Materials Science and Engineering, University of California, Berkeley CA 94720 USA
  4. Department of Physics and Tsinghua-Foxconn Nanotechnology Research Center, Tsinghua University, Beijing 100084 P. R. China
  5. Department of Mechanical Engineering, University of California, Berkeley CA 94720 USA, Department of Physics, Kyungpook National University, 80 Daehak-ro Bukgu Daegu 41566 Republic of Korea
  6. Department of Mechanical Engineering, University of California, Berkeley CA 94720 USA
  7. Department of Materials Science and Engineering, University of California, Berkeley CA 94720 USA, Materials Sciences Division, Lawrence Berkeley National Laboratory, Berkeley CA 94720 USA
  8. State Key Laboratory of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing 100084 P. R. China
  9. State Key Laboratory of Precision Measurement Technology and Instruments, Department of Precision Instrument, Tsinghua University, Beijing 100084 P. R. China
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1412596
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials Journal Volume: 30 Journal Issue: 5; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Dong, Kaichen, Hong, Sukjoon, Deng, Yang, Ma, He, Li, Jiachen, Wang, Xi, Yeo, Junyeob, Wang, Letian, Lou, Shuai, Tom, Kyle B., Liu, Kai, You, Zheng, Wei, Yang, Grigoropoulos, Costas P., Yao, Jie, and Wu, Junqiao. A Lithography-Free and Field-Programmable Photonic Metacanvas. Germany: N. p., 2017. Web. doi:10.1002/adma.201703878.
Dong, Kaichen, Hong, Sukjoon, Deng, Yang, Ma, He, Li, Jiachen, Wang, Xi, Yeo, Junyeob, Wang, Letian, Lou, Shuai, Tom, Kyle B., Liu, Kai, You, Zheng, Wei, Yang, Grigoropoulos, Costas P., Yao, Jie, & Wu, Junqiao. A Lithography-Free and Field-Programmable Photonic Metacanvas. Germany. doi:10.1002/adma.201703878.
Dong, Kaichen, Hong, Sukjoon, Deng, Yang, Ma, He, Li, Jiachen, Wang, Xi, Yeo, Junyeob, Wang, Letian, Lou, Shuai, Tom, Kyle B., Liu, Kai, You, Zheng, Wei, Yang, Grigoropoulos, Costas P., Yao, Jie, and Wu, Junqiao. Mon . "A Lithography-Free and Field-Programmable Photonic Metacanvas". Germany. doi:10.1002/adma.201703878.
@article{osti_1412596,
title = {A Lithography-Free and Field-Programmable Photonic Metacanvas},
author = {Dong, Kaichen and Hong, Sukjoon and Deng, Yang and Ma, He and Li, Jiachen and Wang, Xi and Yeo, Junyeob and Wang, Letian and Lou, Shuai and Tom, Kyle B. and Liu, Kai and You, Zheng and Wei, Yang and Grigoropoulos, Costas P. and Yao, Jie and Wu, Junqiao},
abstractNote = {},
doi = {10.1002/adma.201703878},
journal = {Advanced Materials},
number = 5,
volume = 30,
place = {Germany},
year = {2017},
month = {12}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
DOI: 10.1002/adma.201703878

Citation Metrics:
Cited by: 11 works
Citation information provided by
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