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Title: A Lithography‐Free and Field‐Programmable Photonic Metacanvas

Abstract

Abstract The unique correspondence between mathematical operators and photonic elements in wave optics enables quantitative analysis of light manipulation with individual optical devices. Phase‐transition materials are able to provide real‐time reconfigurability of these devices, which would create new optical functionalities via (re)compilation of photonic operators, as those achieved in other fields such as field‐programmable gate arrays (FPGA). Here, by exploiting the hysteretic phase transition of vanadium dioxide, an all‐solid, rewritable metacanvas on which nearly arbitrary photonic devices can be rapidly and repeatedly written and erased is presented. The writing is performed with a low‐power laser and the entire process stays below 90 °C. Using the metacanvas, dynamic manipulation of optical waves is demonstrated for light propagation, polarization, and reconstruction. The metacanvas supports physical (re)compilation of photonic operators akin to that of FPGA, opening up possibilities where photonic elements can be field programmed to deliver complex, system‐level functionalities.

Authors:
 [1];  [2];  [3];  [4];  [4];  [3];  [5];  [6];  [3];  [7];  [8];  [9];  [4];  [6];  [7]; ORCiD logo [7]
  1. Department of Materials Science and Engineering University of California Berkeley CA 94720 USA, Materials Sciences Division Lawrence Berkeley National Laboratory Berkeley CA 94720 USA, State Key Laboratory of Precision Measurement Technology and Instruments Department of Precision Instrument Tsinghua University Beijing 100084 P. R. China
  2. Department of Mechanical Engineering University of California Berkeley CA 94720 USA, Department of Mechanical Engineering Hanyang University 55 Hanyangdaehak‐ro Sangnok‐gu, Ansan Gyeonggi‐do 15588 Republic of Korea
  3. Department of Materials Science and Engineering University of California Berkeley CA 94720 USA
  4. Department of Physics and Tsinghua‐Foxconn Nanotechnology Research Center Tsinghua University Beijing 100084 P. R. China
  5. Department of Mechanical Engineering University of California Berkeley CA 94720 USA, Department of Physics Kyungpook National University 80 Daehak‐ro Bukgu Daegu 41566 Republic of Korea
  6. Department of Mechanical Engineering University of California Berkeley CA 94720 USA
  7. Department of Materials Science and Engineering University of California Berkeley CA 94720 USA, Materials Sciences Division Lawrence Berkeley National Laboratory Berkeley CA 94720 USA
  8. State Key Laboratory of New Ceramics and Fine Processing School of Materials Science and Engineering Tsinghua University Beijing 100084 P. R. China
  9. State Key Laboratory of Precision Measurement Technology and Instruments Department of Precision Instrument Tsinghua University Beijing 100084 P. R. China
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1412596
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials Journal Volume: 30 Journal Issue: 5; Journal ID: ISSN 0935-9648
Publisher:
Wiley Blackwell (John Wiley & Sons)
Country of Publication:
Germany
Language:
English

Citation Formats

Dong, Kaichen, Hong, Sukjoon, Deng, Yang, Ma, He, Li, Jiachen, Wang, Xi, Yeo, Junyeob, Wang, Letian, Lou, Shuai, Tom, Kyle B., Liu, Kai, You, Zheng, Wei, Yang, Grigoropoulos, Costas P., Yao, Jie, and Wu, Junqiao. A Lithography‐Free and Field‐Programmable Photonic Metacanvas. Germany: N. p., 2017. Web. doi:10.1002/adma.201703878.
Dong, Kaichen, Hong, Sukjoon, Deng, Yang, Ma, He, Li, Jiachen, Wang, Xi, Yeo, Junyeob, Wang, Letian, Lou, Shuai, Tom, Kyle B., Liu, Kai, You, Zheng, Wei, Yang, Grigoropoulos, Costas P., Yao, Jie, & Wu, Junqiao. A Lithography‐Free and Field‐Programmable Photonic Metacanvas. Germany. https://doi.org/10.1002/adma.201703878
Dong, Kaichen, Hong, Sukjoon, Deng, Yang, Ma, He, Li, Jiachen, Wang, Xi, Yeo, Junyeob, Wang, Letian, Lou, Shuai, Tom, Kyle B., Liu, Kai, You, Zheng, Wei, Yang, Grigoropoulos, Costas P., Yao, Jie, and Wu, Junqiao. Mon . "A Lithography‐Free and Field‐Programmable Photonic Metacanvas". Germany. https://doi.org/10.1002/adma.201703878.
@article{osti_1412596,
title = {A Lithography‐Free and Field‐Programmable Photonic Metacanvas},
author = {Dong, Kaichen and Hong, Sukjoon and Deng, Yang and Ma, He and Li, Jiachen and Wang, Xi and Yeo, Junyeob and Wang, Letian and Lou, Shuai and Tom, Kyle B. and Liu, Kai and You, Zheng and Wei, Yang and Grigoropoulos, Costas P. and Yao, Jie and Wu, Junqiao},
abstractNote = {Abstract The unique correspondence between mathematical operators and photonic elements in wave optics enables quantitative analysis of light manipulation with individual optical devices. Phase‐transition materials are able to provide real‐time reconfigurability of these devices, which would create new optical functionalities via (re)compilation of photonic operators, as those achieved in other fields such as field‐programmable gate arrays (FPGA). Here, by exploiting the hysteretic phase transition of vanadium dioxide, an all‐solid, rewritable metacanvas on which nearly arbitrary photonic devices can be rapidly and repeatedly written and erased is presented. The writing is performed with a low‐power laser and the entire process stays below 90 °C. Using the metacanvas, dynamic manipulation of optical waves is demonstrated for light propagation, polarization, and reconstruction. The metacanvas supports physical (re)compilation of photonic operators akin to that of FPGA, opening up possibilities where photonic elements can be field programmed to deliver complex, system‐level functionalities.},
doi = {10.1002/adma.201703878},
journal = {Advanced Materials},
number = 5,
volume = 30,
place = {Germany},
year = {Mon Dec 11 00:00:00 EST 2017},
month = {Mon Dec 11 00:00:00 EST 2017}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1002/adma.201703878

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