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Title: Secondary electron emission yield from high aspect ratio carbon velvet surfaces

Abstract

The plasma electrons bombarding a plasma-facing wall surface can induce secondary electron emission (SEE) from the wall. A strong SEE can enhance the power losses by reducing the wall sheath potential and thereby increasing the electron flux from the plasma to the wall. The use of the materials with surface roughness and the engineered materials with surface architecture is known to reduce the effective SEE by trapping the secondary electrons. In this work, we demonstrate a 65% reduction of SEE yield using a velvet material consisting of high aspect ratio carbon fibers. The measurements of SEE yield for different velvet samples using the electron beam in vacuum demonstrate the dependence of the SEE yield on the fiber length and the packing density, which is strongly affected by the alignment of long velvet fibers with respect to the electron beam impinging on the velvet sample. Furthermore, the results of SEE measurements support the previous observations of the reduced SEE measured in Hall thrusters.

Authors:
 [1]; ORCiD logo [2]; ORCiD logo [2]
  1. Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States); Soochow Univ., Suzhou (China)
  2. Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
Publication Date:
Research Org.:
Princeton Plasma Physics Lab. (PPPL), Princeton, NJ (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1411389
Alternate Identifier(s):
OSTI ID: 1406388
Grant/Contract Number:  
AC02-09CH11466
Resource Type:
Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Volume: 122; Journal Issue: 17; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION TECHNOLOGY

Citation Formats

Jin, Chenggang, Ottaviano, Angelica, and Raitses, Yevgeny. Secondary electron emission yield from high aspect ratio carbon velvet surfaces. United States: N. p., 2017. Web. doi:10.1063/1.4993979.
Jin, Chenggang, Ottaviano, Angelica, & Raitses, Yevgeny. Secondary electron emission yield from high aspect ratio carbon velvet surfaces. United States. doi:10.1063/1.4993979.
Jin, Chenggang, Ottaviano, Angelica, and Raitses, Yevgeny. Wed . "Secondary electron emission yield from high aspect ratio carbon velvet surfaces". United States. doi:10.1063/1.4993979. https://www.osti.gov/servlets/purl/1411389.
@article{osti_1411389,
title = {Secondary electron emission yield from high aspect ratio carbon velvet surfaces},
author = {Jin, Chenggang and Ottaviano, Angelica and Raitses, Yevgeny},
abstractNote = {The plasma electrons bombarding a plasma-facing wall surface can induce secondary electron emission (SEE) from the wall. A strong SEE can enhance the power losses by reducing the wall sheath potential and thereby increasing the electron flux from the plasma to the wall. The use of the materials with surface roughness and the engineered materials with surface architecture is known to reduce the effective SEE by trapping the secondary electrons. In this work, we demonstrate a 65% reduction of SEE yield using a velvet material consisting of high aspect ratio carbon fibers. The measurements of SEE yield for different velvet samples using the electron beam in vacuum demonstrate the dependence of the SEE yield on the fiber length and the packing density, which is strongly affected by the alignment of long velvet fibers with respect to the electron beam impinging on the velvet sample. Furthermore, the results of SEE measurements support the previous observations of the reduced SEE measured in Hall thrusters.},
doi = {10.1063/1.4993979},
journal = {Journal of Applied Physics},
number = 17,
volume = 122,
place = {United States},
year = {2017},
month = {11}
}

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Cited by: 4 works
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