Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition
Abstract
Magnetic refrigeration based on the magnetocaloric effect is one of the best alternatives to compete with vapor-compression technology. Despite being already in its technology transfer stage, there is still room for optimization, namely, on the magnetic responses of the magnetocaloric material. In parallel, the demand for different magnetostrictive materials has been greatly enhanced due to the wide and innovative range of technologies that emerged in the last years (from structural evaluation to straintronics fields). In particular, the Gd5(SixGe1–x)4 compounds are a family of well-known alloys that present both giant magnetocaloric and colossal magnetostriction effects. Despite their remarkable properties, very few reports have been dedicated to the nanostructuring of these materials: here, we report a ~800 nm Gd5Si2.7Ge1.3 thin film. The magnetic and structural investigation revealed that the film undergoes a first order magnetostructural transition and as a consequence exhibits large magnetocaloric effect (–ΔSmMAX~8.83 J kg–1 K–1, ΔH = 5T) and giant thermal expansion (12000 p.p.m). The thin film presents a broader magnetic response in comparison with the bulk compound, which results in a beneficial magnetic hysteresis reduction. The ΔSmMAX exhibited by the Gd5(Si,Ge)4 thin film makes it a promising candidate for micro/nano magnetic refrigeration area.
- Authors:
-
- Iowa State Univ., Ames, IA (United States). Dept. of Electrical and Computer Engineering and Ames Lab.
- Univ. do Porto, Rua do Campo Alegre (Portugal)
- Imperial College, London (United Kingdom)
- Iowa State Univ., Ames, IA (United States). Ames Lab.
- Argonne National Lab. (ANL), Argonne, IL (United States)
- Publication Date:
- Research Org.:
- Argonne National Laboratory (ANL), Argonne, IL (United States)
- Sponsoring Org.:
- USDOE Office of Science (SC), Basic Energy Sciences (BES); Engineering and Physical Sciences Research Council (EPSRC)
- OSTI Identifier:
- 1392396
- Alternate Identifier(s):
- OSTI ID: 1226697
- Grant/Contract Number:
- AC02-06CH11357; EP/G060940/1; AC02-07CH11358
- Resource Type:
- Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Volume: 106; Journal Issue: 3; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 36 MATERIALS SCIENCE
Citation Formats
Hadimani, Ravi L., Silva, Joao H. B., Pereira, Andre M., Schlagel, Devo L., Lograsso, Thomas A., Ren, Yang, Zhang, Xiaoyi, Jiles, David C., and Araújo, Joao P. Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition. United States: N. p., 2015.
Web. doi:10.1063/1.4906056.
Hadimani, Ravi L., Silva, Joao H. B., Pereira, Andre M., Schlagel, Devo L., Lograsso, Thomas A., Ren, Yang, Zhang, Xiaoyi, Jiles, David C., & Araújo, Joao P. Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition. United States. https://doi.org/10.1063/1.4906056
Hadimani, Ravi L., Silva, Joao H. B., Pereira, Andre M., Schlagel, Devo L., Lograsso, Thomas A., Ren, Yang, Zhang, Xiaoyi, Jiles, David C., and Araújo, Joao P. Tue .
"Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition". United States. https://doi.org/10.1063/1.4906056. https://www.osti.gov/servlets/purl/1392396.
@article{osti_1392396,
title = {Gd5(Si,Ge)4 thin film displaying large magnetocaloric and strain effects due to magnetostructural transition},
author = {Hadimani, Ravi L. and Silva, Joao H. B. and Pereira, Andre M. and Schlagel, Devo L. and Lograsso, Thomas A. and Ren, Yang and Zhang, Xiaoyi and Jiles, David C. and Araújo, Joao P.},
abstractNote = {Magnetic refrigeration based on the magnetocaloric effect is one of the best alternatives to compete with vapor-compression technology. Despite being already in its technology transfer stage, there is still room for optimization, namely, on the magnetic responses of the magnetocaloric material. In parallel, the demand for different magnetostrictive materials has been greatly enhanced due to the wide and innovative range of technologies that emerged in the last years (from structural evaluation to straintronics fields). In particular, the Gd5(SixGe1–x)4 compounds are a family of well-known alloys that present both giant magnetocaloric and colossal magnetostriction effects. Despite their remarkable properties, very few reports have been dedicated to the nanostructuring of these materials: here, we report a ~800 nm Gd5Si2.7Ge1.3 thin film. The magnetic and structural investigation revealed that the film undergoes a first order magnetostructural transition and as a consequence exhibits large magnetocaloric effect (–ΔSmMAX~8.83 J kg–1 K–1, ΔH = 5T) and giant thermal expansion (12000 p.p.m). The thin film presents a broader magnetic response in comparison with the bulk compound, which results in a beneficial magnetic hysteresis reduction. The ΔSmMAX exhibited by the Gd5(Si,Ge)4 thin film makes it a promising candidate for micro/nano magnetic refrigeration area.},
doi = {10.1063/1.4906056},
journal = {Applied Physics Letters},
number = 3,
volume = 106,
place = {United States},
year = {Tue Jan 20 00:00:00 EST 2015},
month = {Tue Jan 20 00:00:00 EST 2015}
}
Web of Science
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