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Title: Interfacial Charge Engineering in Ferroelectric-Controlled Mott Transistors

Authors:
 [1] ;  [1] ;  [2] ;  [3] ;  [1] ;  [1] ;  [2] ;  [1] ; ORCiD logo [1]
  1. Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln NE 68588-0299 USA
  2. Department of Mechanical and Materials Engineering & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Lincoln NE 68588-0526 USA
  3. Department of Physics, Columbia University, New York NY 10027 USA, New York University Shanghai, Shanghai 200122 China, NYU-ECNU Institute of Physics, New York University Shanghai, Shanghai 200062 China, Department of Physics, New York University, New York NY 10002 USA
Publication Date:
Grant/Contract Number:
SC0016153
Type:
Publisher's Accepted Manuscript
Journal Name:
Advanced Materials
Additional Journal Information:
Journal Name: Advanced Materials Journal Volume: 29 Journal Issue: 31; Journal ID: ISSN 0935-9648
Publisher:
Wiley
Sponsoring Org:
USDOE
Country of Publication:
Germany
Language:
English
OSTI Identifier:
1375058

Chen, Xuegang, Zhang, Xin, Koten, Mark A., Chen, Hanghui, Xiao, Zhiyong, Zhang, Le, Shield, Jeffrey E., Dowben, Peter A., and Hong, Xia. Interfacial Charge Engineering in Ferroelectric-Controlled Mott Transistors. Germany: N. p., Web. doi:10.1002/adma.201701385.
Chen, Xuegang, Zhang, Xin, Koten, Mark A., Chen, Hanghui, Xiao, Zhiyong, Zhang, Le, Shield, Jeffrey E., Dowben, Peter A., & Hong, Xia. Interfacial Charge Engineering in Ferroelectric-Controlled Mott Transistors. Germany. doi:10.1002/adma.201701385.
Chen, Xuegang, Zhang, Xin, Koten, Mark A., Chen, Hanghui, Xiao, Zhiyong, Zhang, Le, Shield, Jeffrey E., Dowben, Peter A., and Hong, Xia. 2017. "Interfacial Charge Engineering in Ferroelectric-Controlled Mott Transistors". Germany. doi:10.1002/adma.201701385.
@article{osti_1375058,
title = {Interfacial Charge Engineering in Ferroelectric-Controlled Mott Transistors},
author = {Chen, Xuegang and Zhang, Xin and Koten, Mark A. and Chen, Hanghui and Xiao, Zhiyong and Zhang, Le and Shield, Jeffrey E. and Dowben, Peter A. and Hong, Xia},
abstractNote = {},
doi = {10.1002/adma.201701385},
journal = {Advanced Materials},
number = 31,
volume = 29,
place = {Germany},
year = {2017},
month = {6}
}

Works referenced in this record:

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Resolving surface chemical states in XPS analysis of first row transition metals, oxides and hydroxides: Cr, Mn, Fe, Co and Ni
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