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Title: Dynamic Pattern Formation in Electron-Beam-Induced Etching [Emergent formation of dynamic topographic patterns in electron beam induced etching]

Here, we report highly ordered topographic patterns that form on the surface of diamond, span multiple length scales, and have a symmetry controlled by the precursor gas species used in electron-beam-induced etching (EBIE). The pattern formation dynamics reveals an etch rate anisotropy and an electron energy transfer pathway that is overlooked by existing EBIE models. Therefore, we, modify established theory such that it explains our results and remains universally applicable to EBIE. Furthermore, the patterns can be exploited in controlled wetting, optical structuring, and other emerging applications that require nano- and microscale surface texturing of a wide band-gap material.
Authors:
 [1] ;  [2] ;  [3] ;  [3] ;  [3]
  1. Univ. of Technology Sydney, NSW (Astralia). School of Mathematical and Physical Sciences; Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
  2. FEI Company, Hillsboro, OR (United States)
  3. Univ. of Technology Sydney, NSW (Astralia). School of Mathematical and Physical Sciences
Publication Date:
Report Number(s):
LLNL-JRNL--676897
Journal ID: ISSN 0031-9007; PRLTAO
Grant/Contract Number:
AC52-07NA27344; 130100592
Type:
Accepted Manuscript
Journal Name:
Physical Review Letters
Additional Journal Information:
Journal Volume: 115; Journal Issue: 25; Journal ID: ISSN 0031-9007
Publisher:
American Physical Society (APS)
Research Org:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
Sponsoring Org:
USDOE
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE
OSTI Identifier:
1366917
Alternate Identifier(s):
OSTI ID: 1366917