High performance as-grown and annealed high band gap tunnel junctions: Te behavior at the interface
- Authors:
-
- Department of Electrical and Computer Engineering, North Carolina State University, Raleigh, North Carolina 27695, USA
- Publication Date:
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1253928
- Grant/Contract Number:
- EE0005403
- Resource Type:
- Publisher's Accepted Manuscript
- Journal Name:
- Applied Physics Letters
- Additional Journal Information:
- Journal Name: Applied Physics Letters Journal Volume: 108 Journal Issue: 20; Journal ID: ISSN 0003-6951
- Publisher:
- American Institute of Physics
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Bedair, S. M., Harmon, Jeffrey L., Carlin, C. Zachary, Hashem Sayed, Islam E., and Colter, P. C. High performance as-grown and annealed high band gap tunnel junctions: Te behavior at the interface. United States: N. p., 2016.
Web. doi:10.1063/1.4951690.
Bedair, S. M., Harmon, Jeffrey L., Carlin, C. Zachary, Hashem Sayed, Islam E., & Colter, P. C. High performance as-grown and annealed high band gap tunnel junctions: Te behavior at the interface. United States. https://doi.org/10.1063/1.4951690
Bedair, S. M., Harmon, Jeffrey L., Carlin, C. Zachary, Hashem Sayed, Islam E., and Colter, P. C. Thu .
"High performance as-grown and annealed high band gap tunnel junctions: Te behavior at the interface". United States. https://doi.org/10.1063/1.4951690.
@article{osti_1253928,
title = {High performance as-grown and annealed high band gap tunnel junctions: Te behavior at the interface},
author = {Bedair, S. M. and Harmon, Jeffrey L. and Carlin, C. Zachary and Hashem Sayed, Islam E. and Colter, P. C.},
abstractNote = {},
doi = {10.1063/1.4951690},
journal = {Applied Physics Letters},
number = 20,
volume = 108,
place = {United States},
year = {Thu May 19 00:00:00 EDT 2016},
month = {Thu May 19 00:00:00 EDT 2016}
}
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https://doi.org/10.1063/1.4951690
https://doi.org/10.1063/1.4951690
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Cited by: 13 works
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