DOE PAGES title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas

Authors:
ORCiD logo [1];  [2]; ORCiD logo [3];  [2];  [1]
  1. Department of Electrical Engineering and Computer Science, University of Michigan, 1301 Beal Ave, Ann Arbor, Michigan 48109, USA
  2. Nuclear Engineering Department, North Carolina State University, 2500 Stinson Drive, Raleigh, North Carolina 27695, USA
  3. MKS Instruments, Inc. 100 Highpower Road, Rochester, New York 14623, USA
Publication Date:
Sponsoring Org.:
USDOE
OSTI Identifier:
1228183
Grant/Contract Number:  
SC0001319
Resource Type:
Publisher's Accepted Manuscript
Journal Name:
Journal of Applied Physics
Additional Journal Information:
Journal Name: Journal of Applied Physics Journal Volume: 117 Journal Issue: 23; Journal ID: ISSN 0021-8979
Publisher:
American Institute of Physics
Country of Publication:
United States
Language:
English

Citation Formats

Zhang, Yiting, Zafar, Abdullah, Coumou, David J., Shannon, Steven C., and Kushner, Mark J. Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas. United States: N. p., 2015. Web. doi:10.1063/1.4922631.
Zhang, Yiting, Zafar, Abdullah, Coumou, David J., Shannon, Steven C., & Kushner, Mark J. Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas. United States. https://doi.org/10.1063/1.4922631
Zhang, Yiting, Zafar, Abdullah, Coumou, David J., Shannon, Steven C., and Kushner, Mark J. Wed . "Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas". United States. https://doi.org/10.1063/1.4922631.
@article{osti_1228183,
title = {Control of ion energy distributions using phase shifting in multi-frequency capacitively coupled plasmas},
author = {Zhang, Yiting and Zafar, Abdullah and Coumou, David J. and Shannon, Steven C. and Kushner, Mark J.},
abstractNote = {},
doi = {10.1063/1.4922631},
journal = {Journal of Applied Physics},
number = 23,
volume = 117,
place = {United States},
year = {Wed Jun 17 00:00:00 EDT 2015},
month = {Wed Jun 17 00:00:00 EDT 2015}
}

Journal Article:
Free Publicly Available Full Text
Publisher's Version of Record
https://doi.org/10.1063/1.4922631

Citation Metrics:
Cited by: 49 works
Citation information provided by
Web of Science

Save / Share:

Works referenced in this record:

Ion flux asymmetry in radiofrequency capacitively-coupled plasmas excited by sawtooth-like waveforms
journal, August 2014


Retarding field analyzer for ion energy distribution measurements at a radio-frequency biased electrode
journal, March 2008

  • Gahan, D.; Dolinaj, B.; Hopkins, M. B.
  • Review of Scientific Instruments, Vol. 79, Issue 3
  • DOI: 10.1063/1.2890100

On the electrical asymmetry effect in large area multiple frequency capacitively coupled plasmas
journal, January 2014


The electrical asymmetry effect in capacitively coupled radio frequency discharges – measurements of dc self bias, ion energy and ion flux
journal, April 2009


Ion bombardment energy and SiO2/Si fluorocarbon plasma etch selectivity
journal, September 2001

  • Wang, S. -B.; Wendt, A. E.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 19, Issue 5
  • DOI: 10.1116/1.1387056

Optimization of the electrical asymmetry effect in dual-frequency capacitively coupled radio frequency discharges: Experiment, simulation, and model
journal, September 2009

  • Schulze, J.; Schüngel, E.; Czarnetzki, U.
  • Journal of Applied Physics, Vol. 106, Issue 6
  • DOI: 10.1063/1.3223310

On the possibility of making a geometrically symmetric RF-CCP discharge electrically asymmetric
journal, July 2008


The electrical asymmetry effect in multi-frequency capacitively coupled radio frequency discharges
journal, January 2011


Hybrid modelling of low temperature plasmas for fundamental investigations and equipment design
journal, September 2009


Dual radio-frequency discharges: Effective frequency concept and effective frequency transition
journal, July 2005

  • Kim, H. C.; Lee, J. K.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 23, Issue 4
  • DOI: 10.1116/1.1931683

Electron heating and control of ion properties in capacitive discharges driven by customized voltage waveforms
journal, November 2013


Control of ion energy distribution at substrates during plasma processing
journal, July 2000

  • Wang, S. -B.; Wendt, A. E.
  • Journal of Applied Physics, Vol. 88, Issue 2
  • DOI: 10.1063/1.373715

Numerical simulations of electrical asymmetry effect on electronegative plasmas in capacitively coupled rf discharge
journal, January 2011

  • Zhang, Quan-Zhi; Jiang, Wei; Hou, Lu-Jing
  • Journal of Applied Physics, Vol. 109, Issue 1
  • DOI: 10.1063/1.3530626

RF and Microwave Transistor Oscillator Design
book, April 2007


Phenomenological modeling of ion-enhanced surface kinetics in fluorine-based plasma etching
journal, July 1993

  • Gray, David C.
  • Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, Vol. 11, Issue 4
  • DOI: 10.1116/1.586925

Separate control of the ion flux and ion energy in capacitively coupled radio-frequency discharges using voltage waveform tailoring
journal, September 2012

  • Lafleur, T.; Delattre, P. A.; Johnson, E. V.
  • Applied Physics Letters, Vol. 101, Issue 12
  • DOI: 10.1063/1.4754692

Control and optimization of the slope asymmetry effect in tailored voltage waveforms for capacitively coupled plasmas
journal, December 2014


Ion energy distribution control in single and dual frequency capacitive plasma sources
journal, January 2005

  • Lee, J. K.; Manuilenko, O. V.; Babaeva, N. Yu
  • Plasma Sources Science and Technology, Vol. 14, Issue 1
  • DOI: 10.1088/0963-0252/14/1/012

Electron heating mechanisms in dual-frequency capacitive discharges
journal, March 2007


Radio-frequency capacitively coupled plasmas excited by tailored voltage waveforms: comparison of experiment and particle-in-cell simulations
journal, May 2013

  • Delattre, Pierre-Alexandre; Lafleur, Trevor; Johnson, Erik
  • Journal of Physics D: Applied Physics, Vol. 46, Issue 23
  • DOI: 10.1088/0022-3727/46/23/235201

Particle-in-cell simulation of ion energy distributions on an electrode by applying tailored bias waveforms in the afterglow of a pulsed plasma
journal, April 2011

  • Diomede, Paola; Economou, Demetre J.; Donnelly, Vincent M.
  • Journal of Applied Physics, Vol. 109, Issue 8
  • DOI: 10.1063/1.3573488

Functional separation of biasing and sustaining voltages in two-frequency capacitively coupled plasma
journal, July 2000

  • Kitajima, T.; Takeo, Y.; Petrović, Z. Lj.
  • Applied Physics Letters, Vol. 77, Issue 4
  • DOI: 10.1063/1.127020

Making a geometrically asymmetric capacitive rf discharge electrically symmetric
journal, January 2011

  • Schulze, Julian; Schüngel, Edmund; Czarnetzki, Uwe
  • Applied Physics Letters, Vol. 98, Issue 3
  • DOI: 10.1063/1.3544541

Properties of c-C[sub 4]F[sub 8] inductively coupled plasmas. II. Plasma chemistry and reaction mechanism for modeling of Ar/c-C[sub 4]F[sub 8]/O[sub 2] discharges
journal, January 2004

  • Vasenkov, Alex V.; Li, Xi; Oehrlein, Gottlieb S.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, Issue 3
  • DOI: 10.1116/1.1697483

Effect of simultaneous source and bias pulsing in inductively coupled plasma etching
journal, November 2009

  • Agarwal, Ankur; Stout, Phillip J.; Banna, Samer
  • Journal of Applied Physics, Vol. 106, Issue 10
  • DOI: 10.1063/1.3262616

Ion Energy Distribution Skew Control Using Phase-Locked Harmonic RF Bias Drive
journal, July 2014

  • Coumou, David J.; Clark, David Hamilton; Kummerer, Theresa
  • IEEE Transactions on Plasma Science, Vol. 42, Issue 7
  • DOI: 10.1109/TPS.2014.2326600

The effect of the driving frequencies on the electrical asymmetry of dual-frequency capacitively coupled plasmas
journal, October 2012


Frequency dependence of the electrical asymmetry effect in dual-frequency capacitively coupled discharges
journal, April 2013

  • Lafleur, T.; Booth, J. P.
  • Applied Physics Letters, Vol. 102, Issue 15
  • DOI: 10.1063/1.4802241

PIC simulations of the separate control of ion flux and energy in CCRF discharges via the electrical asymmetry effect
journal, December 2008


Deposition of microcrystalline intrinsic silicon by the Electrical Asymmetry Effect technique
journal, January 2013


Controlling VUV photon fluxes in low-pressure inductively coupled plasmas
journal, May 2015


Integrated feature scale modeling of plasma processing of porous and solid SiO2. II. Residual fluorocarbon polymer stripping and barrier layer deposition
journal, July 2004

  • Sankaran, Arvind; Kushner, Mark J.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 22, Issue 4
  • DOI: 10.1116/1.1764822

Heating of a dual frequency capacitively coupled plasma via the plasma series resonance
journal, October 2007

  • Semmler, E.; Awakowicz, P.; von Keudell, A.
  • Plasma Sources Science and Technology, Vol. 16, Issue 4
  • DOI: 10.1088/0963-0252/16/4/020

The electrical asymmetry effect in geometrically asymmetric capacitive radio frequency plasmas
journal, September 2012

  • Schüngel, E.; Eremin, D.; Schulze, J.
  • Journal of Applied Physics, Vol. 112, Issue 5
  • DOI: 10.1063/1.4747914

Integrated plasma equipment model for polysilicon etch profiles in an inductively coupled plasma reactor with subwafer and superwafer topography
journal, July 1997

  • Hoekstra, Robert J.; Grapperhaus, Michael J.; Kushner, Mark J.
  • Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, Vol. 15, Issue 4
  • DOI: 10.1116/1.580659

The influence of the electrical asymmetry effect on deposition uniformity of thin silicon film
journal, April 2013


Cross Sections and Swarm Coefficients for Nitrogen Ions and Neutrals in N 2 and Argon Ions and Neutrals in Ar for Energies from 0.1 eV to 10 keV
journal, May 1991

  • Phelps, A. V.
  • Journal of Physical and Chemical Reference Data, Vol. 20, Issue 3
  • DOI: 10.1063/1.555889