Experimental investigation of ion energy distributions in a dual frequency capacitively coupled Ar/CF{sub 4} plasma

Journal Article · Mon Mar 15 00:00:00 EDT 2010 · Physics of Plasmas

DOI:https://doi.org/10.1063/1.3304186· OSTI ID:21347206

Zhicheng, Li; Dalei, Chang; Xiaosong, Li; Zhenhua, Bi; Wenqi, Lu; Yong, Xu; Aimin, Zhu; Younian, Wang ^[1]

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1. School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)

An energy resolved quadrupole mass spectrometer was adopted to determine ion energy distributions (IEDs) impinging on the ground electrode in a dual frequency (DF) capacitively coupled Ar/CF{sub 4} (95%/5%) plasma. The influences of discharge parameters, such as power of low frequency (LF power) source, frequency of LF source (LF frequency), and gas pressure, on IEDs of Ar{sup +} and CF{sub 3}{sup +} were investigated. The enhancement in LF power, which hence means the increase in sheath potential, results in a significant shift in the IEDs of Ar{sup +} and CF{sub 3}{sup +} toward higher energy area and then a broader energy width. However, the increase in LF frequency leads to narrow and unimodal IEDs, which is probably because the regime of DF CCP has changed during the process. The pressure has a remarkable effect on IEDs structure, i.e., the exhibited saddle-shaped structure of IEDs is obvious in a collisionless sheath at lower pressure but becomes eliminated in a collision sheath at higher pressure. The Ar{sup +} IEDs have low energy regions because of the ion-atomic resonant charge transfer process, while CF{sub 3}{sup +} ions do not. In addition, some of the experimental results are compared with simulation corresponding to our previous work, and general agreements are obtained.

• OSTI ID: 21347206
• Journal Information: Physics of Plasmas, Vol. 17, Issue 3; Other Information: DOI: 10.1063/1.3304186; (c) 2010 American Institute of Physics; ISSN 1070-664X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ARGON
ARGON IONS
CARBON TETRAFLUORIDE
ENERGY SPECTRA
MASS SPECTROMETERS
PLASMA
PLASMA DIAGNOSTICS
PLASMA PRESSURE
PLASMA SHEATH
CHARGED PARTICLES
ELEMENTS
FLUIDS
FLUORINATED ALIPHATIC HYDROCARBONS
GASES
HALOGENATED ALIPHATIC HYDROCARBONS
IONS
MEASURING INSTRUMENTS
NONMETALS
ORGANIC COMPOUNDS
ORGANIC FLUORINE COMPOUNDS
ORGANIC HALOGEN COMPOUNDS
RARE GASES
SPECTRA
SPECTROMETERS