Abstract
The bias voltage can be a very important parameter in r.f. sputtering, Auger electron spectroscopy (AES) and X-ray diffraction (XRD) were used to investigate the influence of this parameter on TiB{sub 2} hard coatings. As a result of the AES measurements the boron-to-titanium ratio depends on the bias voltage. With XRD, significant differences in the various coatings can be observed. (orig.).
Lohmann, R;
Oesterschulze, E;
Thoma, K;
Gaertner, H;
[1]
Herr, W;
Matthes, B;
Broszeit, E;
Kloos, K H
[2]
- Fachbereich Physik, Gesamthochschule Kassel (Germany)
- Inst. fuer Werkstoffkunde, Technische Hochschule Darmstadt (Germany)
Citation Formats
Lohmann, R, Oesterschulze, E, Thoma, K, Gaertner, H, Herr, W, Matthes, B, Broszeit, E, and Kloos, K H.
Analysis of r. f. -sputtered TiB sub 2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy.
Switzerland: N. p.,
1991.
Web.
doi:10.1016/0921-5093(91)90626-X.
Lohmann, R, Oesterschulze, E, Thoma, K, Gaertner, H, Herr, W, Matthes, B, Broszeit, E, & Kloos, K H.
Analysis of r. f. -sputtered TiB sub 2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy.
Switzerland.
https://doi.org/10.1016/0921-5093(91)90626-X
Lohmann, R, Oesterschulze, E, Thoma, K, Gaertner, H, Herr, W, Matthes, B, Broszeit, E, and Kloos, K H.
1991.
"Analysis of r. f. -sputtered TiB sub 2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy."
Switzerland.
https://doi.org/10.1016/0921-5093(91)90626-X.
@misc{etde_6224824,
title = {Analysis of r. f. -sputtered TiB sub 2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy}
author = {Lohmann, R, Oesterschulze, E, Thoma, K, Gaertner, H, Herr, W, Matthes, B, Broszeit, E, and Kloos, K H}
abstractNote = {The bias voltage can be a very important parameter in r.f. sputtering, Auger electron spectroscopy (AES) and X-ray diffraction (XRD) were used to investigate the influence of this parameter on TiB{sub 2} hard coatings. As a result of the AES measurements the boron-to-titanium ratio depends on the bias voltage. With XRD, significant differences in the various coatings can be observed. (orig.).}
doi = {10.1016/0921-5093(91)90626-X}
journal = []
volume = {139:1/2}
place = {Switzerland}
year = {1991}
month = {Jul}
}
title = {Analysis of r. f. -sputtered TiB sub 2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy}
author = {Lohmann, R, Oesterschulze, E, Thoma, K, Gaertner, H, Herr, W, Matthes, B, Broszeit, E, and Kloos, K H}
abstractNote = {The bias voltage can be a very important parameter in r.f. sputtering, Auger electron spectroscopy (AES) and X-ray diffraction (XRD) were used to investigate the influence of this parameter on TiB{sub 2} hard coatings. As a result of the AES measurements the boron-to-titanium ratio depends on the bias voltage. With XRD, significant differences in the various coatings can be observed. (orig.).}
doi = {10.1016/0921-5093(91)90626-X}
journal = []
volume = {139:1/2}
place = {Switzerland}
year = {1991}
month = {Jul}
}