Analysis of r. f. -sputtered TiB sub 2 hard coatings by means of X-ray diffractometry and Auger electron spectroscopy Lohmann, R; Oesterschulze, E; Thoma, K; Gaertner, H [Fachbereich Physik, Gesamthochschule Kassel (Germany)]; Herr, W; Matthes, B; Broszeit, E; Kloos, K H [Inst. fuer Werkstoffkunde, Technische Hochschule Darmstadt (Germany)] 36 MATERIALS SCIENCE; TITANIUM BORIDES; AUGER ELECTRON SPECTROSCOPY; THIN FILMS; X-RAY DIFFRACTION; COATINGS; ELECTRIC CONDUCTIVITY; ELECTRIC POTENTIAL; ELECTRON DIFFRACTION; SCANNING ELECTRON MICROSCOPY; SPUTTERING; TEMPERATURE DEPENDENCE; BORIDES; BORON COMPOUNDS; COHERENT SCATTERING; DIFFRACTION; ELECTRICAL PROPERTIES; ELECTRON MICROSCOPY; ELECTRON SPECTROSCOPY; FILMS; MICROSCOPY; PHYSICAL PROPERTIES; SCATTERING; SPECTROSCOPY; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication; 360202 - Ceramics, Cermets, & Refractories- Structure & Phase Studies The bias voltage can be a very important parameter in r.f. sputtering, Auger electron spectroscopy (AES) and X-ray diffraction (XRD) were used to investigate the influence of this parameter on TiB{sub 2} hard coatings. As a result of the AES measurements the boron-to-titanium ratio depends on the bias voltage. With XRD, significant differences in the various coatings can be observed. (orig.). Switzerland 1991-07-01 English Conference Journal Article Journal Name: Materials Science and Engineering. A, Structural Materials: Properties, Microstructure and Processing; (Switzerland); Journal Volume: 139:1/2; Conference: 2. international conference on plasma surface engineering, Garmisch-Partenkirchen (Germany), 10-14 Sep 1990 Medium: X; Size: Pages: 259-263 https://doi.org/10.1016/0921-5093(91)90626-X [] 139:1/2 CONF-900933- Journal ID: ISSN 0921-5093; CODEN: MSAPE CHF-91-0F1494; EDB-92-003739 2010-05-13 6224824