Abstract
An r.f. plasma beam source which was modified for the production of monoenergetic mixed gas-metal plasma beams has been used for the direct beam deposition of TiN[sub x] layers. Ti was sputter injected into the source plasma maintained in different N[sub 2]-Ar gas mixtures. The energy E[sub ion] of the ion component in the electrically neutral plasma beam was varied between 30 and 200 eV. A strong influence of the nitrogen fraction in the working gas was found on both the growth rate and the composition of the TiN[sub x] layers with x varying from 1 to 1.8. Structural analysis with grazing-incidence X-ray diffraction revealed an average grain size of 160 A and a transition from a random crystallite orientation at E[sub ion] = 30 eV to a strong (111) fibre texture for E[sub ion] above 130 eV. (orig.)
Weber, F R;
[1]
Oechsner, H
[1]
- Technische Physik und Schwerpunkt Materialwissenschaften, Univ. Kaiserslautern (Germany)
Citation Formats
Weber, F R, and Oechsner, H.
Direct plasma beam deposition of TiN[sub x] layers with an r. f. plasma beam source.
Switzerland: N. p.,
1993.
Web.
Weber, F R, & Oechsner, H.
Direct plasma beam deposition of TiN[sub x] layers with an r. f. plasma beam source.
Switzerland.
Weber, F R, and Oechsner, H.
1993.
"Direct plasma beam deposition of TiN[sub x] layers with an r. f. plasma beam source."
Switzerland.
@misc{etde_5507751,
title = {Direct plasma beam deposition of TiN[sub x] layers with an r. f. plasma beam source}
author = {Weber, F R, and Oechsner, H}
abstractNote = {An r.f. plasma beam source which was modified for the production of monoenergetic mixed gas-metal plasma beams has been used for the direct beam deposition of TiN[sub x] layers. Ti was sputter injected into the source plasma maintained in different N[sub 2]-Ar gas mixtures. The energy E[sub ion] of the ion component in the electrically neutral plasma beam was varied between 30 and 200 eV. A strong influence of the nitrogen fraction in the working gas was found on both the growth rate and the composition of the TiN[sub x] layers with x varying from 1 to 1.8. Structural analysis with grazing-incidence X-ray diffraction revealed an average grain size of 160 A and a transition from a random crystallite orientation at E[sub ion] = 30 eV to a strong (111) fibre texture for E[sub ion] above 130 eV. (orig.)}
journal = []
volume = {59:1-3}
place = {Switzerland}
year = {1993}
month = {Oct}
}
title = {Direct plasma beam deposition of TiN[sub x] layers with an r. f. plasma beam source}
author = {Weber, F R, and Oechsner, H}
abstractNote = {An r.f. plasma beam source which was modified for the production of monoenergetic mixed gas-metal plasma beams has been used for the direct beam deposition of TiN[sub x] layers. Ti was sputter injected into the source plasma maintained in different N[sub 2]-Ar gas mixtures. The energy E[sub ion] of the ion component in the electrically neutral plasma beam was varied between 30 and 200 eV. A strong influence of the nitrogen fraction in the working gas was found on both the growth rate and the composition of the TiN[sub x] layers with x varying from 1 to 1.8. Structural analysis with grazing-incidence X-ray diffraction revealed an average grain size of 160 A and a transition from a random crystallite orientation at E[sub ion] = 30 eV to a strong (111) fibre texture for E[sub ion] above 130 eV. (orig.)}
journal = []
volume = {59:1-3}
place = {Switzerland}
year = {1993}
month = {Oct}
}