<?xml version="1.0" encoding="UTF-8" ?>
<rdf:RDF xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcq="http://purl.org/dc/terms/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#">
     <records>
	  <record>
	       <dc:title>Direct plasma beam deposition of TiN[sub x] layers with an r. f. plasma beam source</dc:title>
	       <dc:creator>Weber, F R [Technische Physik und Schwerpunkt Materialwissenschaften, Univ. Kaiserslautern (Germany)]; Oechsner, H [Technische Physik und Schwerpunkt Materialwissenschaften, Univ. Kaiserslautern (Germany)]</dc:creator>
	       <dc:subject>36 MATERIALS SCIENCE; FILMS; TEXTURE; TITANIUM NITRIDES; SPUTTERING; ARGON; CHEMICAL COMPOSITION; ELECTRIC CONDUCTIVITY; GRAIN ORIENTATION; GRAIN SIZE; ION BEAMS; MASS SPECTROSCOPY; PLASMA; BEAMS; ELECTRICAL PROPERTIES; ELEMENTS; FLUIDS; GASES; MICROSTRUCTURE; NITRIDES; NITROGEN COMPOUNDS; NONMETALS; ORIENTATION; PHYSICAL PROPERTIES; PNICTIDES; RARE GASES; SIZE; SPECTROSCOPY; TITANIUM COMPOUNDS; TRANSITION ELEMENT COMPOUNDS; 360201* - Ceramics, Cermets, & Refractories- Preparation & Fabrication</dc:subject>
	       <dc:subjectRelated></dc:subjectRelated>
	       <dc:description>An r.f. plasma beam source which was modified for the production of monoenergetic mixed gas-metal plasma beams has been used for the direct beam deposition of TiN[sub x] layers. Ti was sputter injected into the source plasma maintained in different N[sub 2]-Ar gas mixtures. The energy E[sub ion] of the ion component in the electrically neutral plasma beam was varied between 30 and 200 eV. A strong influence of the nitrogen fraction in the working gas was found on both the growth rate and the composition of the TiN[sub x] layers with x varying from 1 to 1.8. Structural analysis with grazing-incidence X-ray diffraction revealed an average grain size of 160 A and a transition from a random crystallite orientation at E[sub ion] = 30 eV to a strong (111) fibre texture for E[sub ion] above 130 eV. (orig.)</dc:description>
	       <dcq:publisher></dcq:publisher>
	       <dcq:publisherResearch></dcq:publisherResearch>
	       <dcq:publisherAvailability></dcq:publisherAvailability>
	       <dcq:publisherSponsor></dcq:publisherSponsor>
	       <dcq:publisherCountry>Switzerland</dcq:publisherCountry>
		   <dc:contributingOrganizations></dc:contributingOrganizations>
	       <dc:date>1993-10-01</dc:date>
	       <dc:language>English</dc:language>
	       <dc:type>Conference</dc:type>
	       <dcq:typeQualifier>Journal Article</dcq:typeQualifier>
	       <dc:relation>Journal Name: Surface and Coatings Technology; (Switzerland); Journal Volume: 59:1-3; Conference: 3. international conference on plasma surface engineering, Garmisch-Partenkirchen (Germany), 25-29 Oct 1992</dc:relation>
	       <dc:coverage></dc:coverage>
	       <dc:format>Medium: X; Size: Pages: 234-238</dc:format>
	       <dc:doi>https://doi.org/</dc:doi>
	       <dc:identifier></dc:identifier>
		   <dc:journalName>[]</dc:journalName>
		   <dc:journalIssue></dc:journalIssue>
		   <dc:journalVolume>59:1-3</dc:journalVolume>
	       <dc:identifierReport>CONF-921044-</dc:identifierReport>
	       <dcq:identifierDOEcontract></dcq:identifierDOEcontract>
	       <dc:identifierOther>Journal ID: ISSN 0257-8972; CODEN: SCTEEJ</dc:identifierOther>
	       <dc:source>CHF; CHF-94-0G1923; EDB-94-037238</dc:source>
	       <dc:rights></dc:rights>
	       <dc:dateEntry>2008-02-06</dc:dateEntry>
	       <dc:dateAdded></dc:dateAdded>
	       <dc:ostiId>5507751</dc:ostiId>
	       <dcq:identifier-purl></dcq:identifier-purl>
	  </record>
     </records>
</rdf:RDF>