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High photosensitivity few-layered MoSe2 back-gated field-effect phototransistors

Abstract

In this paper, we report on the fabrication and optoelectronic properties of high sensitive phototransistors based on few-layered MoSe2 back-gated field-effect transistors, with a mobility of 19.7 cm{sup 2} V{sup −1} s{sup −1} at room temperature. We obtained an ultrahigh photoresponsivity of 97.1 AW{sup −1} and an external quantum efficiency (EQE) of 22 666% using 532 nm laser excitation at room temperature. The photoresponsivity was improved near the threshold gate voltage; however, the selection of the silicon dioxide as a gate oxide represents a limiting factor in the ultimate performance. Thanks to their high photoresponsivity and external quantum efficiency, the few-layered MoSe2-based devices are promising for photoelectronic applications. (paper)
Authors:
Abderrahmane, A; Ishizawa, S; Sandhu, A; [1]  Ko, P J; Thu, T V; Takamura, T [2] 
  1. Department of Electrical and Electronic Information Engineering, Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi 441-8580 (Japan)
  2. Electronics-Inspired Interdisciplinary Research Institute (EIIRIS), Toyohashi University of Technology, 1-1 Hibarigaoka, Tempaku-cho, Toyohashi, Aichi 441-8580 (Japan)
Publication Date:
Aug 20, 2014
Product Type:
Journal Article
Resource Relation:
Journal Name: Nanotechnology (Print); Journal Volume: 25; Journal Issue: 36; Other Information: Country of input: International Atomic Energy Agency (IAEA)
Subject:
77 NANOSCIENCE AND NANOTECHNOLOGY; 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; ELECTRIC POTENTIAL; EXCITATION; FABRICATION; FIELD EFFECT TRANSISTORS; MOBILITY; OPTOELECTRONIC DEVICES; PERFORMANCE; PHOTOSENSITIVITY; PHOTOTRANSISTORS; QUANTUM EFFICIENCY; SILICON OXIDES; TEMPERATURE RANGE 0273-0400 K
OSTI ID:
22377296
Country of Origin:
United Kingdom
Language:
English
Other Identifying Numbers:
Journal ID: ISSN 0957-4484; TRN: GB15P4420082758
Availability:
Available from http://dx.doi.org/10.1088/0957-4484/25/36/365202
Submitting Site:
INIS
Size:
[5 page(s)]
Announcement Date:
Aug 13, 2015

Citation Formats

Abderrahmane, A, Ishizawa, S, Sandhu, A, Ko, P J, Thu, T V, and Takamura, T. High photosensitivity few-layered MoSe2 back-gated field-effect phototransistors. United Kingdom: N. p., 2014. Web. doi:10.1088/0957-4484/25/36/365202.
Abderrahmane, A, Ishizawa, S, Sandhu, A, Ko, P J, Thu, T V, & Takamura, T. High photosensitivity few-layered MoSe2 back-gated field-effect phototransistors. United Kingdom. https://doi.org/10.1088/0957-4484/25/36/365202
Abderrahmane, A, Ishizawa, S, Sandhu, A, Ko, P J, Thu, T V, and Takamura, T. 2014. "High photosensitivity few-layered MoSe2 back-gated field-effect phototransistors." United Kingdom. https://doi.org/10.1088/0957-4484/25/36/365202.
@misc{etde_22377296,
title = {High photosensitivity few-layered MoSe2 back-gated field-effect phototransistors}
author = {Abderrahmane, A, Ishizawa, S, Sandhu, A, Ko, P J, Thu, T V, and Takamura, T}
abstractNote = {In this paper, we report on the fabrication and optoelectronic properties of high sensitive phototransistors based on few-layered MoSe2 back-gated field-effect transistors, with a mobility of 19.7 cm{sup 2} V{sup −1} s{sup −1} at room temperature. We obtained an ultrahigh photoresponsivity of 97.1 AW{sup −1} and an external quantum efficiency (EQE) of 22 666% using 532 nm laser excitation at room temperature. The photoresponsivity was improved near the threshold gate voltage; however, the selection of the silicon dioxide as a gate oxide represents a limiting factor in the ultimate performance. Thanks to their high photoresponsivity and external quantum efficiency, the few-layered MoSe2-based devices are promising for photoelectronic applications. (paper)}
doi = {10.1088/0957-4484/25/36/365202}
journal = []
issue = {36}
volume = {25}
journal type = {AC}
place = {United Kingdom}
year = {2014}
month = {Aug}
}