Method and apparatus for improved high power impulse magnetron sputtering
Abstract
A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.
- Inventors:
- Issue Date:
- Research Org.:
- Lawrence Berkeley National Laboratory (LBNL), Berkeley, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1107879
- Patent Number(s):
- 8574410
- Application Number:
- 12/989,378
- Assignee:
- The Regents of the University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C23 - COATING METALLIC MATERIAL C23C - COATING METALLIC MATERIAL
H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- DOE Contract Number:
- AC02-05CH11231
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 42 ENGINEERING
Citation Formats
Anders, Andre. Method and apparatus for improved high power impulse magnetron sputtering. United States: N. p., 2013.
Web.
Anders, Andre. Method and apparatus for improved high power impulse magnetron sputtering. United States.
Anders, Andre. Tue .
"Method and apparatus for improved high power impulse magnetron sputtering". United States. https://www.osti.gov/servlets/purl/1107879.
@article{osti_1107879,
title = {Method and apparatus for improved high power impulse magnetron sputtering},
author = {Anders, Andre},
abstractNote = {A high power impulse magnetron sputtering apparatus and method using a vacuum chamber with a magnetron target and a substrate positioned in the vacuum chamber. A field coil being positioned between the magnetron target and substrate, and a pulsed power supply and/or a coil bias power supply connected to the field coil. The pulsed power supply connected to the field coil, and the pulsed power supply outputting power pulse widths of greater that 100 .mu.s.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 05 00:00:00 EST 2013},
month = {Tue Nov 05 00:00:00 EST 2013}
}
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Works referenced in this record:
Linear magnetron arc evaporation or sputtering source
patent, February 2002
- Welty, Richard P.
- US Patent Document 6,350,356
Process and apparatus for coating conducting pieces using a pulsed glow discharge
patent, May 1991
- Gruen, Reinar
- US Patent Document 5,015,493