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Title: Methods for globally treating silica optics to reduce optical damage

Abstract

A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.

Inventors:
; ; ; ; ; ; ;
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1080314
Patent Number(s):
8313662
Application Number:
12/572,220
Assignee:
Lawrence Livermore National Security, LLC (Livermore, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B29 - WORKING OF PLASTICS B29D - PRODUCING PARTICULAR ARTICLES FROM PLASTICS OR FROM SUBSTANCES IN A PLASTIC STATE
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
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DOE Contract Number:  
AC52-07NA27344
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE

Citation Formats

Miller, Philip Edward, Suratwala, Tayyab Ishaq, Bude, Jeffrey Devin, Shen, Nan, Steele, William Augustus, Laurence, Ted Alfred, Feit, Michael Dennis, and Wong, Lana Louie. Methods for globally treating silica optics to reduce optical damage. United States: N. p., 2012. Web.
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Miller, Philip Edward, Suratwala, Tayyab Ishaq, Bude, Jeffrey Devin, Shen, Nan, Steele, William Augustus, Laurence, Ted Alfred, Feit, Michael Dennis, & Wong, Lana Louie. Methods for globally treating silica optics to reduce optical damage. United States.
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Miller, Philip Edward, Suratwala, Tayyab Ishaq, Bude, Jeffrey Devin, Shen, Nan, Steele, William Augustus, Laurence, Ted Alfred, Feit, Michael Dennis, and Wong, Lana Louie. Tue . "Methods for globally treating silica optics to reduce optical damage". United States. https://www.osti.gov/servlets/purl/1080314.
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@article{osti_1080314,
title = {Methods for globally treating silica optics to reduce optical damage},
author = {Miller, Philip Edward and Suratwala, Tayyab Ishaq and Bude, Jeffrey Devin and Shen, Nan and Steele, William Augustus and Laurence, Ted Alfred and Feit, Michael Dennis and Wong, Lana Louie},
abstractNote = {A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Nov 20 00:00:00 EST 2012},
month = {Tue Nov 20 00:00:00 EST 2012}
}
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Works referenced in this record:

Wet chemical etching of silicate glasses in hydrofluoric acid based solutions
journal, December 1993

Cleaning of Substrate Surfaces
book, January 1999

Solvent and ligand effects on the optical properties of silver nanoparticles in silica sol-gel films
conference, August 2009

Laser damage precursors in fused silica
conference, December 2009

  • Miller, P. E.; Suratwala, T. I.; Bude, J. D.
  • Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, SPIE Proceedings
  • https://doi.org/10.1117/12.836986
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