Composition and method for removing photoresist materials from electronic components

Davenhall, Leisa B; Rubin, James B; Taylor, Craig M. V.

Title: Composition and method for removing photoresist materials from electronic components

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Abstract

Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.

Inventors:

Davenhall, Leisa B ^[1]; Rubin, James B ^[2]; Taylor, Craig M. V. ^[3]

Santa Fe, NM
Los Alamos, NM
Jemez Springs, NM

Issue Date:: 2008-06-03

Research Org.:: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 936715

Patent Number(s):: 7381694

Application Number:: 11/034,519

Assignee:: Los Alamos National Security, LLC (Los Alamos, NM)

Patent Classifications (CPCs):: C - CHEMISTRY C11 - ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES C11D - DETERGENT COMPOSITIONS

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES

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C - CHEMISTRY C11 - ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES C11D - DETERGENT COMPOSITIONS
C11D7/28 - containing halogen

G - PHYSICS G03 - PHOTOGRAPHY G03F - PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES
G03F7/422 - {using liquids only

B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B08B7/00 - Cleaning by methods not provided for in a single other subclass or a single group in this subclass

C - CHEMISTRY C11 - ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES C11D - DETERGENT COMPOSITIONS
C11D7/5004 - {Organic solvents}
C11D7/266 - {Esters
C11D7/34 - containing sulfur
C11D11/0047 - {Electronic devices, e.g. PCBs, semiconductors}

B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B08B3/102 - {with means for agitating the liquid

C - CHEMISTRY C11 - ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES C11D - DETERGENT COMPOSITIONS
C11D7/267 - {Heterocyclic compounds}
C11D7/24 - Hydrocarbons
C11D7/50 - Solvents

B - PERFORMING OPERATIONS B08 - CLEANING B08B - CLEANING IN GENERAL
B08B7/0021 - {by liquid gases or supercritical fluids}

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01L - SEMICONDUCTOR DEVICES
H01L21/31133 - {by chemical means}

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DOE Contract Number:: W-7405-ENG-36

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 36 MATERIALS SCIENCE

Citation Formats


                    Davenhall, Leisa B, Rubin, James B, and Taylor, Craig M. V. Composition and method for removing photoresist materials from electronic components.  United States: N. p., 2008. 
        Web.

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                    Davenhall, Leisa B, Rubin, James B, & Taylor, Craig M. V. Composition and method for removing photoresist materials from electronic components.  United States.

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                    Davenhall, Leisa B, Rubin, James B, and Taylor, Craig M. V. Tue .  
        "Composition and method for removing photoresist materials from electronic components".  United States.  https://www.osti.gov/servlets/purl/936715.

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@article{osti_936715,

  title        = {Composition and method for removing photoresist materials from electronic components},

  author       = {Davenhall, Leisa B and Rubin, James B and Taylor, Craig M. V.},

  abstractNote = {Composition and method for removing photoresist materials from electronic components. The composition is a mixture of at least one dense phase fluid and at least one dense phase fluid modifier. The method includes exposing a substrate to at least one pulse of the composition in a supercritical state to remove photoresist materials from the substrate.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2008},

  month        = {6}

}

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