High reflectance-low stress Mo-Si multilayer reflective coatings
Abstract
A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.
- Inventors:
-
- Livermore, CA
- Sunol, CA
- Issue Date:
- Research Org.:
- Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
- OSTI Identifier:
- 873195
- Patent Number(s):
- 6110607
- Assignee:
- Regents of University of California (Oakland, CA)
- Patent Classifications (CPCs):
-
C - CHEMISTRY C03 - GLASS C03C - CHEMICAL COMPOSITION OF GLASSES, GLAZES, OR VITREOUS ENAMELS
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- W-7405-ENG-48
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- reflectance-low; stress; mo-si; multilayer; reflective; coatings; coating; particularly; useful; extreme; ultraviolet; euv; wavelength; region; particular; application; lithography; numerous; applications; reflectance; utilized; near-normal; incidence; gtoreq; 65; residual; ltoreq; 100; mpa; produced; thermal; non-thermal; approaches; approach; involves; heating; temperature; time; deposition; induce; structural; changes; overall; relaxation; effect; reducing; significantly; multilayer reflective; multilayer coatings; normal incidence; reflective coating; wavelength region; multilayer coating; reflective coatings; particular application; particularly useful; extreme ultraviolet; residual stress; approach involves; stress multilayer; stress mo-si; reflectance-low stress; mo-si multilayer; involves heating; structural changes; /428/359/427/
Citation Formats
Montcalm, Claude, and Mirkarimi, Paul B. High reflectance-low stress Mo-Si multilayer reflective coatings. United States: N. p., 2000.
Web.
Montcalm, Claude, & Mirkarimi, Paul B. High reflectance-low stress Mo-Si multilayer reflective coatings. United States.
Montcalm, Claude, and Mirkarimi, Paul B. Sat .
"High reflectance-low stress Mo-Si multilayer reflective coatings". United States. https://www.osti.gov/servlets/purl/873195.
@article{osti_873195,
title = {High reflectance-low stress Mo-Si multilayer reflective coatings},
author = {Montcalm, Claude and Mirkarimi, Paul B},
abstractNote = {A high reflectance-low stress Mo-Si multilayer reflective coating particularly useful for the extreme ultraviolet (EUV) wavelength region. While the multilayer reflective coating has particular application for EUV lithography, it has numerous other applications where high reflectance and low stress multilayer coatings are utilized. Multilayer coatings having high near-normal incidence reflectance (R.gtoreq.65%) and low residual stress (.ltoreq.100 MPa) have been produced using thermal and non-thermal approaches. The thermal approach involves heating the multilayer coating to a given temperature for a given time after deposition in order to induce structural changes in the multilayer coating that will have an overall "relaxation" effect without reducing the reflectance significantly.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Sat Jan 01 00:00:00 EST 2000},
month = {Sat Jan 01 00:00:00 EST 2000}
}
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