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Title: Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography

Abstract

A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.

Inventors:
 [1];  [2];  [3]
+ Show Inventor Affiliations
  1. Livermore, CA
  2. Los Altos, CA
  3. Pleasanton, CA
Issue Date:
Research Org.:
Lawrence Livermore National Laboratory (LLNL), Livermore, CA (United States)
OSTI Identifier:
872542
Patent Number(s):
5958605
Assignee:
Regents of University of California (Oakland, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B82 - NANOTECHNOLOGY B82Y - SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
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DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
passivating; overcoat; bilayer; multilayer; reflective; coatings; extreme; ultraviolet; lithography; euv; soft; x-ray; applications; prevent; oxidation; corrosion; coating; improving; optical; performance; comprises; layer; silicon; beryllium; underneath; top; elemental; compound; material; resists; materials; carbon; palladium; carbides; borides; nitrides; oxides; thicknesses; layers; optimized; produce; reflectance; wavelength; range; operation; protective; systems; comprising; multilayer reflective; reflective coating; optical performance; multilayer coating; reflective coatings; systems comprising; wavelength range; layer comprises; top layer; ultraviolet lithography; extreme ultraviolet; soft x-ray; compound material; overcoat bilayer; euv optical; prevent oxidation; passivating overcoat; /428/378/

Citation Formats

Montcalm, Claude, Stearns, Daniel G, and Vernon, Stephen P. Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography. United States: N. p., 1999. Web.
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Montcalm, Claude, Stearns, Daniel G, & Vernon, Stephen P. Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography. United States.
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Montcalm, Claude, Stearns, Daniel G, and Vernon, Stephen P. Fri . "Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography". United States. https://www.osti.gov/servlets/purl/872542.
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@article{osti_872542,
title = {Passivating overcoat bilayer for multilayer reflective coatings for extreme ultraviolet lithography},
author = {Montcalm, Claude and Stearns, Daniel G and Vernon, Stephen P},
abstractNote = {A passivating overcoat bilayer is used for multilayer reflective coatings for extreme ultraviolet (EUV) or soft x-ray applications to prevent oxidation and corrosion of the multilayer coating, thereby improving the EUV optical performance. The overcoat bilayer comprises a layer of silicon or beryllium underneath at least one top layer of an elemental or a compound material that resists oxidation and corrosion. Materials for the top layer include carbon, palladium, carbides, borides, nitrides, and oxides. The thicknesses of the two layers that make up the overcoat bilayer are optimized to produce the highest reflectance at the wavelength range of operation. Protective overcoat systems comprising three or more layers are also possible.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1999},
month = {1}
}
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Works referenced in this record:

Tarnishing of Mo/Si multilayer x-ray mirrors
journal, January 1993

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