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Title: Recovery of Mo/Si multilayer coated optical substrates

Abstract

Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO.sub.2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.

Inventors:
 [1];  [1];  [2]
  1. (Pleasanton, CA)
  2. (Los Altos, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
871277
Patent Number(s):
5698113
Application Number:
08/607055
Assignee:
Regents of University of California (Oakland, CA) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
recovery; multilayer; coated; optical; substrates; multilayers; removed; superpolished; zerodur; fused; silica; dry; etching; process; suitable; processing; conditions; produces; negligible; change; substrate; surface; figure; roughness; step; removes; sio; overlayer; fluroine-containing; gas; moves; molybdenum; silicon; chlorine-containing; initial; normal; incidence; extreme; ultra-violet; euv; reflectance; response; demonstrated; reprocessed; surface figure; optical substrates; normal incidence; fused silica; dry etching; etching process; substrate surface; containing gas; surface roughness; chlorine-containing gas; optical substrate; coated optical; extreme ultra-violet; process removes; suitable processing; processing conditions; /216/427/

Citation Formats

Baker, Sherry L., Vernon, Stephen P., and Stearns, Daniel G. Recovery of Mo/Si multilayer coated optical substrates. United States: N. p., 1997. Web.
Baker, Sherry L., Vernon, Stephen P., & Stearns, Daniel G. Recovery of Mo/Si multilayer coated optical substrates. United States.
Baker, Sherry L., Vernon, Stephen P., and Stearns, Daniel G. Tue . "Recovery of Mo/Si multilayer coated optical substrates". United States. https://www.osti.gov/servlets/purl/871277.
@article{osti_871277,
title = {Recovery of Mo/Si multilayer coated optical substrates},
author = {Baker, Sherry L. and Vernon, Stephen P. and Stearns, Daniel G.},
abstractNote = {Mo/Si multilayers are removed from superpolished ZERODUR and fused silica substrates with a dry etching process that, under suitable processing conditions, produces negligible change in either the substrate surface figure or surface roughness. The two step dry etching process removes SiO.sub.2 overlayer with a fluroine-containing gas and then moves molybdenum and silicon multilayers with a chlorine-containing gas. Full recovery of the initial normal incidence extreme ultra-violet (EUV) reflectance response has been demonstrated on reprocessed substrates.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {12}
}

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