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Title: (110) Oriented silicon wafer latch accelerometer and process for forming the same

Abstract

A method for etching a (110) silicon wafer to produce latching cantilever beams, which bend parallel to the surface of the wafer. The resulting apparatus is also part of the invention.

Inventors:
 [1]
  1. (Livermore, CA)
Issue Date:
Research Org.:
Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
OSTI Identifier:
867230
Patent Number(s):
4891255
Assignee:
United States of America as represented by United States (Washington, DC) LLNL
DOE Contract Number:  
W-7405-ENG-48
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
110; oriented; silicon; wafer; latch; accelerometer; process; forming; method; etching; produce; latching; cantilever; beams; bend; parallel; surface; resulting; apparatus; silicon wafer; /428/73/216/

Citation Formats

Ciarlo, Dino R. (110) Oriented silicon wafer latch accelerometer and process for forming the same. United States: N. p., 1990. Web.
Ciarlo, Dino R. (110) Oriented silicon wafer latch accelerometer and process for forming the same. United States.
Ciarlo, Dino R. Mon . "(110) Oriented silicon wafer latch accelerometer and process for forming the same". United States. https://www.osti.gov/servlets/purl/867230.
@article{osti_867230,
title = {(110) Oriented silicon wafer latch accelerometer and process for forming the same},
author = {Ciarlo, Dino R.},
abstractNote = {A method for etching a (110) silicon wafer to produce latching cantilever beams, which bend parallel to the surface of the wafer. The resulting apparatus is also part of the invention.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1990},
month = {1}
}

Patent:

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