Coupled microwave ECR and radio-frequency plasma source for plasma processing
Abstract
In a dual plasma device, the first plasma is a microwave discharge having its own means of plasma initiation and control. The microwave discharge operates at electron cyclotron resonance (ECR), and generates a uniform plasma over a large area of about 1000 cm[sup 2] at low pressures below 0.1 mtorr. The ECR microwave plasma initiates the second plasma, a radio frequency (RF) plasma maintained between parallel plates. The ECR microwave plasma acts as a source of charged particles, supplying copious amounts of a desired charged excited species in uniform manner to the RF plasma. The parallel plate portion of the apparatus includes a magnetic filter with static magnetic field structure that aids the formation of ECR zones in the two plasma regions, and also assists in the RF plasma also operating at electron cyclotron resonance. 4 figures.
- Inventors:
- Issue Date:
- OSTI Identifier:
- 5017678
- Patent Number(s):
- 5292370
- Application Number:
- PPN: US 7-930590
- Assignee:
- Martin Marietta Energy Systems, Inc., Oak Ridge, TN (United States)
- DOE Contract Number:
- AC05-84OR21400
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 14 Aug 1992
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 71 CLASSICAL AND QUANTUM MECHANICS, GENERAL PHYSICS; PLASMA PRODUCTION; MICROWAVE RADIATION; ELECTRIC DISCHARGES; ELECTRON CYCLOTRON-RESONANCE; MICROWAVE EQUIPMENT; USES; CYCLOTRON RESONANCE; ELECTROMAGNETIC RADIATION; ELECTRONIC EQUIPMENT; EQUIPMENT; RADIATIONS; RESONANCE; 661300* - Other Aspects of Physical Science- (1992-)
Citation Formats
Tsai, C C, and Haselton, H H. Coupled microwave ECR and radio-frequency plasma source for plasma processing. United States: N. p., 1994.
Web.
Tsai, C C, & Haselton, H H. Coupled microwave ECR and radio-frequency plasma source for plasma processing. United States.
Tsai, C C, and Haselton, H H. Tue .
"Coupled microwave ECR and radio-frequency plasma source for plasma processing". United States.
@article{osti_5017678,
title = {Coupled microwave ECR and radio-frequency plasma source for plasma processing},
author = {Tsai, C C and Haselton, H H},
abstractNote = {In a dual plasma device, the first plasma is a microwave discharge having its own means of plasma initiation and control. The microwave discharge operates at electron cyclotron resonance (ECR), and generates a uniform plasma over a large area of about 1000 cm[sup 2] at low pressures below 0.1 mtorr. The ECR microwave plasma initiates the second plasma, a radio frequency (RF) plasma maintained between parallel plates. The ECR microwave plasma acts as a source of charged particles, supplying copious amounts of a desired charged excited species in uniform manner to the RF plasma. The parallel plate portion of the apparatus includes a magnetic filter with static magnetic field structure that aids the formation of ECR zones in the two plasma regions, and also assists in the RF plasma also operating at electron cyclotron resonance. 4 figures.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Mar 08 00:00:00 EST 1994},
month = {Tue Mar 08 00:00:00 EST 1994}
}