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Title: Optimized ECR plasma apparatus with varied microwave window thickness

Abstract

The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design. 9 figs.

Inventors:
Issue Date:
Research Org.:
Oak Ridge National Laboratory (ORNL), Oak Ridge, TN (United States)
OSTI Identifier:
131911
Patent Number(s):
5466991
Application Number:
PAN: 8-340,140; CNN: Contract ERD-89-876; TRN: 96:004585
Assignee:
Sematech, Inc., Austin, TX (United States)
DOE Contract Number:  
AC05-84OR21400
Resource Type:
Patent
Resource Relation:
Other Information: PBD: 14 Nov 1995
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION; THERMONUCLEAR REACTORS; MICROWAVE EQUIPMENT; CONTROL; HIGH-FREQUENCY DISCHARGES; PLASMA PRODUCTION; MICROWAVE RADIATION; ELECTRON CYCLOTRON-RESONANCE

Citation Formats

Berry, L A. Optimized ECR plasma apparatus with varied microwave window thickness. United States: N. p., 1995. Web.
Berry, L A. Optimized ECR plasma apparatus with varied microwave window thickness. United States.
Berry, L A. Tue . "Optimized ECR plasma apparatus with varied microwave window thickness". United States.
@article{osti_131911,
title = {Optimized ECR plasma apparatus with varied microwave window thickness},
author = {Berry, L A},
abstractNote = {The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design. 9 figs.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1995},
month = {11}
}

Patent:
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