Global to push GA events into
skip to main content

Title: Optimized ECR plasma apparatus with varied microwave window thickness

The present invention describes a technique to control the radial profile of microwave power in an ECR plasma discharge. In order to provide for a uniform plasma density to a specimen, uniform energy absorption by the plasma is desired. By controlling the radial profile of the microwave power transmitted through the microwave window of a reactor, the profile of the transmitted energy to the plasma can be controlled in order to have uniform energy absorption by the plasma. An advantage of controlling the profile using the window transmission characteristics is that variations to the radial profile of microwave power can be made without changing the microwave coupler or reactor design. 9 figs.
Inventors:
Issue Date:
OSTI Identifier:
131911
Assignee:
Sematech, Inc., Austin, TX (United States) PTO; SCA: 700460; PA: EDB-95:159776; SN: 95001485786
Patent Number(s):
US 5,466,991/A/
Application Number:
PAN: 8-340,140; CNN: Contract ERD-89-876; TRN: 96:004585
Contract Number:
AC05-84OR21400
Resource Relation:
Other Information: PBD: 14 Nov 1995
Research Org:
Lockheed Martin Energy Syst Inc
Country of Publication:
United States
Language:
English
Subject:
70 PLASMA PHYSICS AND FUSION; THERMONUCLEAR REACTORS; MICROWAVE EQUIPMENT; CONTROL; HIGH-FREQUENCY DISCHARGES; PLASMA PRODUCTION; MICROWAVE RADIATION; ELECTRON CYCLOTRON-RESONANCE

Similar records in DOepatents and OSTI.GOV collections: