Enhanced microfabrication using electrochemical techniques
Abstract
A method is provided for subtractively processing a layer of etchable material formed over an electrically conductive surface region of a workpiece. The workpiece is immersed in a liquid solution, generally but not exclusively a conductive solution, that comprises an etchant for the etchable material, so that etching of the etchable material is initiated. An electric circuit is connected to include a control electrode, a reference electrode, and the electrically conductive surface region of the workpiece. The electric circuit is used to monitor the development process dynamically at each of a plurality of intervals during the etching. The etching is terminated when the electrochemical signal satisfies a criterion indicating that the etching is complete.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-NM), Albuquerque, NM (United States)
- Sponsoring Org.:
- USDOE National Nuclear Security Administration (NNSA)
- OSTI Identifier:
- 1987026
- Patent Number(s):
- 11549903
- Application Number:
- 16/244,501
- Assignee:
- National Technology & Engineering Solutions of Sandia, LLC (Albuquerque, NM)
- DOE Contract Number:
- NA0003525
- Resource Type:
- Patent
- Resource Relation:
- Patent File Date: 01/10/2019
- Country of Publication:
- United States
- Language:
- English
Citation Formats
Arrington, Christian, Dagel, Amber Lynn, Pillars, Jamin Ryan, St. John, Christopher, Coleman, Jonathan, Perez, Carlos R., Hollowell, Andrew E., and Baca, Kalin. Enhanced microfabrication using electrochemical techniques. United States: N. p., 2023.
Web.
Arrington, Christian, Dagel, Amber Lynn, Pillars, Jamin Ryan, St. John, Christopher, Coleman, Jonathan, Perez, Carlos R., Hollowell, Andrew E., & Baca, Kalin. Enhanced microfabrication using electrochemical techniques. United States.
Arrington, Christian, Dagel, Amber Lynn, Pillars, Jamin Ryan, St. John, Christopher, Coleman, Jonathan, Perez, Carlos R., Hollowell, Andrew E., and Baca, Kalin. Tue .
"Enhanced microfabrication using electrochemical techniques". United States. https://www.osti.gov/servlets/purl/1987026.
@article{osti_1987026,
title = {Enhanced microfabrication using electrochemical techniques},
author = {Arrington, Christian and Dagel, Amber Lynn and Pillars, Jamin Ryan and St. John, Christopher and Coleman, Jonathan and Perez, Carlos R. and Hollowell, Andrew E. and Baca, Kalin},
abstractNote = {A method is provided for subtractively processing a layer of etchable material formed over an electrically conductive surface region of a workpiece. The workpiece is immersed in a liquid solution, generally but not exclusively a conductive solution, that comprises an etchant for the etchable material, so that etching of the etchable material is initiated. An electric circuit is connected to include a control electrode, a reference electrode, and the electrically conductive surface region of the workpiece. The electric circuit is used to monitor the development process dynamically at each of a plurality of intervals during the etching. The etching is terminated when the electrochemical signal satisfies a criterion indicating that the etching is complete.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2023},
month = {1}
}
Works referenced in this record:
Ionic liquid thin layer sensor for electrochemical and/or piezoelectric measurements
patent, February 2013
- Zeng, Xiangqun; Yu, Lei; Huang, Yue
- US Patent Document 8,375,768
Electrochemical impedance spectroscopy as a tool for investigating underpaint corrosion
journal, May 1996
- Bonora, P. L.; Deflorian, F.; Fedrizzi, L.
- Electrochimica Acta, Vol. 41, Issue 7-8
Gap Fill Process Stability Monitoring of an Electroplating Process Using a Potential-Controlled Exit Step
patent-application, March 2018
- Ma, Quan; Ghongadi, Shantinath; He, Zhian
- US Patent Application 15/269628; 20180080140
Sequential Infiltration Synthesis for Enhancing Multiple-Patterning Lithography
patent-application, October 2013
- Darling, Seth B.; Elam, Jeffrey W.; Tseng, Yu-Chih
- US Patent Application 13/902169; 20130256265
Method of manufacture of wafers using an electro-chemical residue sensor (ECRS)
patent, August 2012
- Vermeire, Bert M.; Shadman, Farhang F.
- US Patent Document 8,253,422
Liga Developer Apparatus System
patent-application, July 2005
- Boehme, Dale R.; Bankert, Michelle A.; Christenson, Todd R.
- US Patent Application 11/015364; 20050155707
Electrochemical Endpoint Lithography Techniques Applied to PMMA LIGA Fabrication of Xpci Gold Gratings
journal, July 2018
- Arrington, Christian L.; Hollowell, Andrew E.; Finnegan, Patrick Sean
- ECS Meeting Abstracts, Vol. MA2018-02, Issue 52
Electrochemical impedance behaviour of type 304L stainless steel under tensile loading
journal, November 2004
- Trethewey, K. R.; Paton, M.
- Materials Letters, Vol. 58, Issue 27-28
Composition for etching treatment of resin material
patent, May 2017
- Nagamine, Shingo; Kita, Koji; Otsuka, Kuniaki
- US Patent Document 9,657,226