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Title: Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction

Abstract

A device for processing gases includes a cylindrical housing in which an electrically grounded, metal injection/extraction gas supply tube is disposed. A dielectric tube surrounds the injection/extraction gas supply tube to establish a gas modification passage therearound. Additionally, a metal high voltage electrode circumscribes the dielectric tube. The high voltage electrode is energizable to create nonthermal electrical microdischarges between the high voltage electrode and the injection/extraction gas supply tube across the dielectric tube within the gas modification passage. An injection/extraction gas and a process gas flow through the nonthermal electrical microdischarges within the gas modification passage and a modified process gas results. Using the device contaminants that are entrained in the process gas can be destroyed to yield a cleaner, modified process gas.

Inventors:
Issue Date:
Research Org.:
Univ. of California, Oakland, CA (United States)
Sponsoring Org.:
USDOE
OSTI Identifier:
1175795
Patent Number(s):
7063819
Application Number:
10/395,046
Assignee:
The Regents of the University of California (Oakland, CA)
Patent Classifications (CPCs):
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
DOE Contract Number:  
W-7405-ENG-36
Resource Type:
Patent
Country of Publication:
United States
Language:
English
Subject:
47 OTHER INSTRUMENTATION

Citation Formats

Rosocha, Louis A. Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction. United States: N. p., 2006. Web.
Rosocha, Louis A. Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction. United States.
Rosocha, Louis A. Tue . "Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction". United States. https://www.osti.gov/servlets/purl/1175795.
@article{osti_1175795,
title = {Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction},
author = {Rosocha, Louis A.},
abstractNote = {A device for processing gases includes a cylindrical housing in which an electrically grounded, metal injection/extraction gas supply tube is disposed. A dielectric tube surrounds the injection/extraction gas supply tube to establish a gas modification passage therearound. Additionally, a metal high voltage electrode circumscribes the dielectric tube. The high voltage electrode is energizable to create nonthermal electrical microdischarges between the high voltage electrode and the injection/extraction gas supply tube across the dielectric tube within the gas modification passage. An injection/extraction gas and a process gas flow through the nonthermal electrical microdischarges within the gas modification passage and a modified process gas results. Using the device contaminants that are entrained in the process gas can be destroyed to yield a cleaner, modified process gas.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {Tue Jun 20 00:00:00 EDT 2006},
month = {Tue Jun 20 00:00:00 EDT 2006}
}

Works referenced in this record:

Reduction of NO/sub x/ from combustion flue gases by superimposed barrier discharge plasma reactors
journal, January 1997


Acid Gas Removal Characteristics of Corona Discharge Methane Radical Shower-Catalyst Hybrid System for Treatment of Jet Engine Test Cell Flue Gas
conference, October 1999


Removal of NOx from flue gas by corona discharge activated methane radical showers
journal, June 1997


Simultaneous removal of NO x and SO 2 from NO-SO 2 -CO 2 -N 2 -O 2 gas mixtures by corona radical shower systems
journal, January 1999


Time dependence of NO/sub x/ removal rate by a corona radical shower system
journal, January 1996


NO/NOx removal with C2 H2 as additive via dielectric barrier discharges
journal, May 2001