Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor

Rosocha, Louis A; Ferreri, Vincent; Kim, Yongho

Title: Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor

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Abstract

The present invention comprises a field enhanced electrode package for use in a non-thermal plasma processor. The field enhanced electrode package includes a high voltage electrode and a field-enhancing electrode with a dielectric material layer disposed in-between the high voltage electrode and the field-enhancing electrode. The field-enhancing electrode features at least one raised section that includes at least one injection hole that allows plasma discharge streamers to occur primarily within an injected additive gas.

Inventors:

Rosocha, Louis A ^[1]; Ferreri, Vincent ^[2]; Kim, Yongho ^[1]

Los Alamos, NM
Westminster, CO

Issue Date:: 2009-04-21

Research Org.:: Los Alamos National Lab. (LANL), Los Alamos, NM (United States)

Sponsoring Org.:: USDOE

OSTI Identifier:: 972295

Patent Number(s):: 7521026

Application Number:: 11/017,392

Assignee:: Los Alamos National Security, LLC (Los Alamos, NM)

Patent Classifications (CPCs):: B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE

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B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J2219/0841 - Metal
B01J2219/0835 - substantially flat

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H1/2406 - {Dielectric barrier discharges}

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J2219/083 - cylindrical

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H1/24 - Generating plasma {

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/32009 - {Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J2219/0875 - Gas
B01J19/088 - {giving rise to electric discharges

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D53/323 - {by electrostatic effects or by high-voltage electric fields}

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J2219/0896 - Cold plasma

H - ELECTRICITY H01 - BASIC ELECTRIC ELEMENTS H01J - ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
H01J37/32348 - {Dielectric barrier discharge}

H - ELECTRICITY H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR H05H - PLASMA TECHNIQUE
H05H2001/2443 - {Flow through, i.e. the plasma fluid flowing in a dielectric tube}

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01D - SEPARATION
B01D2259/818 - Employing electrical discharges or the generation of a plasma

B - PERFORMING OPERATIONS B01 - PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL B01J - CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY
B01J2219/0809 - employing two or more electrodes
B01J2219/0869 - Feeding or evacuating the reactor

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DOE Contract Number:: W-7405-ENG-36

Resource Type:: Patent

Country of Publication:: United States

Language:: English

Subject:: 47 OTHER INSTRUMENTATION

Citation Formats


                    Rosocha, Louis A, Ferreri, Vincent, and Kim, Yongho. Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor.  United States: N. p., 2009. 
        Web.

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                    Rosocha, Louis A, Ferreri, Vincent, & Kim, Yongho. Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor.  United States.

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                    Rosocha, Louis A, Ferreri, Vincent, and Kim, Yongho. Tue .  
        "Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor".  United States.  https://www.osti.gov/servlets/purl/972295.

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@article{osti_972295,

  title        = {Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor},

  author       = {Rosocha, Louis A and Ferreri, Vincent and Kim, Yongho},

  abstractNote = {The present invention comprises a field enhanced electrode package for use in a non-thermal plasma processor. The field enhanced electrode package includes a high voltage electrode and a field-enhancing electrode with a dielectric material layer disposed in-between the high voltage electrode and the field-enhancing electrode. The field-enhancing electrode features at least one raised section that includes at least one injection hole that allows plasma discharge streamers to occur primarily within an injected additive gas.},

  doi          = {},

  journal      = {},
number       = ,

  volume       = ,

  place        = {United States},

  year         = {2009},

  month        = {4}

}

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