Long working distance interference microscope
Abstract
Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.
- Inventors:
- Issue Date:
- Research Org.:
- Sandia National Lab. (SNL-CA), Livermore, CA (United States)
- Sponsoring Org.:
- USDOE
- OSTI Identifier:
- 1174810
- Patent Number(s):
- 6721094
- Application Number:
- 09/800,047
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Classifications (CPCs):
-
G - PHYSICS G01 - MEASURING G01B - MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS
G - PHYSICS G02 - OPTICS G02B - OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS
- DOE Contract Number:
- AC04-94AL85000
- Resource Type:
- Patent
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 47 OTHER INSTRUMENTATION
Citation Formats
Sinclair, Michael B., DeBoer, Maarten P., and Smith, Norman F. Long working distance interference microscope. United States: N. p., 2004.
Web.
Sinclair, Michael B., DeBoer, Maarten P., & Smith, Norman F. Long working distance interference microscope. United States.
Sinclair, Michael B., DeBoer, Maarten P., and Smith, Norman F. Tue .
"Long working distance interference microscope". United States. https://www.osti.gov/servlets/purl/1174810.
@article{osti_1174810,
title = {Long working distance interference microscope},
author = {Sinclair, Michael B. and DeBoer, Maarten P. and Smith, Norman F.},
abstractNote = {Disclosed is a long working distance interference microscope suitable for three-dimensional imaging and metrology of MEMS devices and test structures on a standard microelectronics probe station. The long working distance of 10-30 mm allows standard probes or probe cards to be used. This enables nanometer-scale 3-D height profiles of MEMS test structures to be acquired across an entire wafer. A well-matched pair of reference/sample objectives is not required, significantly reducing the cost of this microscope, as compared to a Linnik microinterferometer.},
doi = {},
journal = {},
number = ,
volume = ,
place = {United States},
year = {2004},
month = {4}
}
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