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Title: Surface core-level photoelectron diffraction of surface reconstructions

Book ·
OSTI ID:99491
;  [1]; ;  [2]
  1. Univ. of Oregon, Eugene, OR (United States). Dept. of Physics
  2. Univ. of Wisconsin, Milwaukee, WI (United States). Dept. of Physics

Experimental surface core-level shifts (SCLSs) aid in understanding the roles of altered electronic and screening properties at reconstructed semiconductor surfaces. Because of unresolved theoretical issues, the assignment of SCLSs has often remained controversial even though the surface geometry has been completely determined with traditional probes. Angular- and energy-dependent x-ray photoelectron diffraction (XPD) of each chemically resolved surface core-level electron can be used to discriminate the structure around each chemically shifted species. However, this technique requires tunability, high energy resolution to separate the SCLSs from the bulk core-levels, and high photon flux in order to gather large amounts of data in a reasonable time. Using the newly commissioned spectromicroscopy beamline 7.0 at the Advanced Light Source, the authors have acquired chemically-resolved XPD data for Si(111) 7{times}7 for several photon energies, and by examination of forward-focusing peaks they can draw tentative conclusions about the atomic origins of each core-level shifted peak.

OSTI ID:
99491
Report Number(s):
CONF-941144-; ISBN 1-55899-277-4; TRN: 95:019139
Resource Relation:
Conference: Fall meeting of the Materials Research Society (MRS), Boston, MA (United States), 28 Nov - 9 Dec 1994; Other Information: PBD: 1995; Related Information: Is Part Of Applications of synchrotron radiation techniques to materials science II; Terminello, L.J. [ed.] [Lawrence Livermore National Lab., CA (United States)]; Shinn, N.D. [ed.] [Sandia National Labs., Albuquerque, NM (United States)]; Ice, G.E. [ed.] [Oak Ridge National Lab., TN (United States)]; D`Amico, K.L. [ed.] [X-ray Analytics, Ltd., Hinsdale, IL (United States)]; Perry, D.L. [ed.] [Lawrence Berkeley Lab., CA (United States)]; PB: 349 p.; Materials Research Society symposium proceedings, Volume 375
Country of Publication:
United States
Language:
English