Structural origin of Si-2p core-level shifts from Si(100)-c[4x2] surface: A spectral x-ray photoelectron diffraction study
Abstract
The authors have performed angle-resolved x-ray photoelectron diffraction (XPD) from a Si(100)-c(4x2) surface to study the structural origin of Si-2p core-level shifts. In the experiment, the highly resolved surface Si-2p core-level spectra were measured as a fine grid of hemisphere and photon energies, using the SpectroMicroscopy Facility {open_quotes}ultraESCA{close_quotes} instrument. By carefully decomposing the spectra into several surface peaks, the authors are able to obtain surface-atom resolved XPD patterns. Using a multiple scattering analysis, they derived a detailed atomic model for the Si(100)-c(4x2) surface. In this model, the asymmetric dimers were found tilted by 11.5 plus/minus 2.0 degrees with bond length of 2.32 plus/minus 0.05{angstrom}. By matching model XPD patterns to experiment, the authors can identify which atoms in the reconstructed surface are responsible for specific photoemission lines in the 2p spectrum.
- Authors:
-
- Univ. of Wisconsin, Milwaukee, WI (United States)
- Univ. of Wisconsin, Milwaukee, WI (United States); Ernest Orlando Lawrence Berkeley National Lab., CA (United States); and others
- Publication Date:
- Research Org.:
- Lawrence Berkeley Lab., CA (United States)
- OSTI Identifier:
- 603550
- Report Number(s):
- LBNL-39981
ON: DE97007345; CNN: Grant DMR-9413475; TRN: 98:009544
- DOE Contract Number:
- FG02-92ER45468
- Resource Type:
- Technical Report
- Resource Relation:
- Other Information: PBD: Apr 1997; Related Information: Is Part Of Advanced light source: Compendium of user abstracts 1993--1996; PB: 622 p.
- Country of Publication:
- United States
- Language:
- English
- Subject:
- 66 PHYSICS; SILICON; MONOCRYSTALS; PHOTOELECTRON SPECTROSCOPY; INNER-SHELL EXCITATION; EXCITED STATES; CRYSTAL STRUCTURE; SOFT X RADIATION
Citation Formats
Chen, X., Tonner, B. P., and Denlinger, J. Structural origin of Si-2p core-level shifts from Si(100)-c[4x2] surface: A spectral x-ray photoelectron diffraction study. United States: N. p., 1997.
Web. doi:10.2172/603550.
Chen, X., Tonner, B. P., & Denlinger, J. Structural origin of Si-2p core-level shifts from Si(100)-c[4x2] surface: A spectral x-ray photoelectron diffraction study. United States. https://doi.org/10.2172/603550
Chen, X., Tonner, B. P., and Denlinger, J. Tue .
"Structural origin of Si-2p core-level shifts from Si(100)-c[4x2] surface: A spectral x-ray photoelectron diffraction study". United States. https://doi.org/10.2172/603550. https://www.osti.gov/servlets/purl/603550.
@article{osti_603550,
title = {Structural origin of Si-2p core-level shifts from Si(100)-c[4x2] surface: A spectral x-ray photoelectron diffraction study},
author = {Chen, X. and Tonner, B. P. and Denlinger, J.},
abstractNote = {The authors have performed angle-resolved x-ray photoelectron diffraction (XPD) from a Si(100)-c(4x2) surface to study the structural origin of Si-2p core-level shifts. In the experiment, the highly resolved surface Si-2p core-level spectra were measured as a fine grid of hemisphere and photon energies, using the SpectroMicroscopy Facility {open_quotes}ultraESCA{close_quotes} instrument. By carefully decomposing the spectra into several surface peaks, the authors are able to obtain surface-atom resolved XPD patterns. Using a multiple scattering analysis, they derived a detailed atomic model for the Si(100)-c(4x2) surface. In this model, the asymmetric dimers were found tilted by 11.5 plus/minus 2.0 degrees with bond length of 2.32 plus/minus 0.05{angstrom}. By matching model XPD patterns to experiment, the authors can identify which atoms in the reconstructed surface are responsible for specific photoemission lines in the 2p spectrum.},
doi = {10.2172/603550},
url = {https://www.osti.gov/biblio/603550},
journal = {},
number = ,
volume = ,
place = {United States},
year = {1997},
month = {4}
}