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Temperature dependence of epitaxial graphene formation on SiC(0001).

Journal Article · · J. Electron. Mater.

The formation of epitaxial graphene on SiC(0001) surfaces is studied using atomic force microscopy, Auger electron spectroscopy, electron diffraction, Raman spectroscopy, and electrical measurements. Starting from hydrogen-annealed surfaces, graphene formation by vacuum annealing is observed to begin at about 1150 C, with the overall step-terrace arrangement of the surface being preserved but with significant roughness (pit formation) on the terraces. At higher temperatures near 1250 C, the step morphology changes, with the terraces becoming more compact. At 1350 C and above, the surface morphology changes into relatively large flat terraces separated by step bunches. Features believed to arise from grain boundaries in the graphene are resolved on the terraces, as are fainter features attributed to atoms at the buried graphene/SiC interface.

Research Organization:
Argonne National Laboratory (ANL)
Sponsoring Organization:
SC; NSF; Air Force Research Lab.
DOE Contract Number:
AC02-06CH11357
OSTI ID:
990515
Report Number(s):
ANL/CNM/JA-62648
Journal Information:
J. Electron. Mater., Journal Name: J. Electron. Mater. Journal Issue: 6 ; 2009 Vol. 38; ISSN JECMA5; ISSN 0361-5235
Country of Publication:
United States
Language:
ENGLISH

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