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Title: Bulk GaN and AIGaN/GaN heterostructure drift velocity measurements and comparison to theoretical models.

Journal Article · · Proposed for publication in Journal of Applied Physics.
OSTI ID:990084

The room-temperature velocity-field characteristics for n-type gallium nitride and AlGaN/GaN heterostructures, grown epitaxially on sapphire, were determined experimentally. A pulsed voltage input and four-point measurements were used on special geometry samples to determine the electron drift velocity as a function of applied electric field in the basal plane. These measurements show apparent saturation velocities near 2.5 x 10{sup 7} cm/s at 180 kV/cm for the n-type gallium nitride and 3.1 x 10{sup 7} cm/s at 140 kV/cm for the AlGaN/GaN heterostructures. A comparison of these studies shows that the experimental velocities are close to previously published simulations based upon Monte Carlo techniques.

Research Organization:
Sandia National Laboratories (SNL), Albuquerque, NM, and Livermore, CA (United States)
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
990084
Report Number(s):
SAND2005-2129J; JAPIAU; TRN: US201020%%119
Journal Information:
Proposed for publication in Journal of Applied Physics., Vol. 97, Issue 6; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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