Optical method for the characterization of laterally patterned samples in integrated circuits

Maris, Humphrey J

Optical method for the characterization of laterally patterned samples in integrated circuits

Patent · 17 March 2009

OSTI ID:988384

Maris, Humphrey J ^[1]

Barrington, RI

Disclosed is a method for characterizing a sample having a structure disposed on or within the sample, comprising the steps of applying a first pulse of light to a surface of the sample for creating a propagating strain pulse in the sample, applying a second pulse of light to the surface so that the second pulse of light interacts with the propagating strain pulse in the sample, sensing from a reflection of the second pulse a change in optical response of the sample, and relating a time of occurrence of the change in optical response to at least one dimension of the structure.

Research Organization:: Brown University (Providence, RI)

Sponsoring Organization:: USDOE

DOE Contract Number:: FG02-86ER45267

Assignee:: Brown University (Providence, RI)

Patent Number(s):: 7,505,154

Application Number:: 12/072,841

OSTI ID:: 988384

Country of Publication:: United States

Language:: English

References (12)

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