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Epitaxial growth of aligned AlGalnN nanowires by metal-organic chemical vapor deposition

Patent ·
OSTI ID:985518

Highly ordered and aligned epitaxy of III-Nitride nanowires is demonstrated in this work. <1010> M-axis is identified as a preferential nanowire growth direction through a detailed study of GaN/AlN trunk/branch nanostructures by transmission electron microscopy. Crystallographic selectivity can be used to achieve spatial and orientational control of nanowire growth. Vertically aligned (Al)GaN nanowires are prepared on M-plane AlN substrates. Horizontally ordered nanowires, extending from the M-plane sidewalls of GaN hexagonal mesas or islands demonstrate new opportunities for self-aligned nanowire devices, interconnects, and networks.

Research Organization:
NETL (National Energy Technology Laboratory, Pittsburgh, PA, and Morgantown, WV (United States))
Sponsoring Organization:
USDOE
DOE Contract Number:
FC26-03NT41941
Assignee:
Yale University (New Haven, CT)
Patent Number(s):
7,407,872
Application Number:
11/207,226
OSTI ID:
985518
Country of Publication:
United States
Language:
English

References (23)

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