Thin film epitaxy and structure property correlations for non-polar ZnO films
- North Carolina State University
- ORNL
- University of North Carolina, Chapel Hill
Heteroepitaxial growth and strain relaxation were investigated in non-polar a-plane (11-20)ZnO films grown on r-plane (10-12)sapphire substrates in the temperature range 200-700 C by pulsed laser deposition. The lattice misfit in the plane of the film for this orientation varied from -1.26% in [0001] to ?18.52% in the [-1100] direction. The alignment of (11-20)ZnO planes parallel to (10-12)sapphire planes was confirmed by X-ray diffraction {theta}-2{theta} scans over the entire temperature range. X-ray {psi}-scans revealed the epitaxial relationship:[0001]ZnO[-1101]sap; [-1100]ZnO[-1-120]sap. Depending on the growth temperature, variations in the structural, optical and electrical properties were observed in the grown films. Room temperature photoluminescence for films grown at 700 C shows a strong band-edge emission. The ratio of the band-edge emission to green band emission is 135:1, indicating reduced defects and excellent optical quality of the films. The resistivity data for the films grown at 700 C shows semiconducting behavior with room temperature resistivity of 2.2 x 10{sup -3} {Omega}-cm.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States)
- Sponsoring Organization:
- USDOE Office of Science (SC)
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 979317
- Journal Information:
- Acta Materialia, Vol. 57, Issue 15; ISSN 1359-6454
- Country of Publication:
- United States
- Language:
- English
Similar Records
Interfacial structure and defect analysis of nonpolar ZnO films grown on R-plane sapphire by molecular beam epitaxy
The microstructural study of aluminum nitride thin films: Epitaxy on the two orientations of sapphire and texturing on Si