Nanowire-templated lateral epitaxial growth of non-polar group III nitrides
Patent
·
OSTI ID:978685
- Albuquerque, NM
A method for growing high quality, nonpolar Group III nitrides using lateral growth from Group III nitride nanowires. The method of nanowire-templated lateral epitaxial growth (NTLEG) employs crystallographically aligned, substantially vertical Group III nitride nanowire arrays grown by metal-catalyzed metal-organic chemical vapor deposition (MOCVD) as templates for the lateral growth and coalescence of virtually crack-free Group III nitride films. This method requires no patterning or separate nitride growth step.
- Research Organization:
- Sandia National Laboratories (SNL-NM), Albuquerque, NM
- Sponsoring Organization:
- USDOE
- DOE Contract Number:
- AC04-94AL85000
- Assignee:
- Sandia Corporation (Albuquerque, NM)
- Patent Number(s):
- 7,670,933
- Application Number:
- 11/866,748
- OSTI ID:
- 978685
- Country of Publication:
- United States
- Language:
- English
Trenched epitaxial lateral overgrowth of fast coalesced a-plane GaN with low dislocation density
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journal | December 2006 |
Highly aligned, template-free growth and characterization of vertical GaN nanowires on sapphire by metal–organic chemical vapour deposition
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journal | November 2006 |
One-step lateral growth for reduction in defect density of a -plane GaN on r -sapphire substrate and its application in light emitters
|
journal | June 2007 |
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