IMPORTANCE OF IN SITU MONITORS IN THE PREPARATION OF LAYERED OXIDE HETEROSTRUCTURES BY REACTIVE MBE.

Conference · Mon Jan 01 04:00:00 EST 2001

DOI:https://doi.org/10.1557/PROC-619-105· OSTI ID:975266

Schlom, Darrell G; Haeni, J H; Theis, C D ^[1]; Tian, W; Pan, X Q; Brown, G W ^[2]; Hawley, M E ^[3]

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1. Christopher
2. Geoffrey W.
3. Marilyn E.

Using a variety of in situ monitors and when possible adsorption-controlled growth conditions, layered oxide heterostructures including new compounds and metastable superlattices have been grown by reactive molecular beam epitaxy (MBE). The heteroepitaxial layers grown include Bi{sub 4}Ti{sub 3}O{sub 12}-SrTiO{sub 3} and Bi{sub 4}Ti{sub 3}O{sub 12}-PbTiO{sub 3} Aurivillius phases, Sr{sub n+1}Ti{sub n}O{sub 3n+1} Ruddlesden-Popper phases, and metastable PbTiO{sub 3}/SrTiO{sub 3} and BaTiO{sub 3}/SrTiO{sub 3} superlattices. Accurate composition control is key to the controlled growth of such structures, and to this end combinations of reflection high-energy electron diffraction (RHEED), atomic absorption spectroscopy (AA), a quartz crystal microbalance (QCM), and adsorption-controlled growth conditions were employed during growth. The structural perfection of the films has been investigated using in situ RHEED, four-circle x-ray diffraction, atomic force microscopy (AFM), and high-resolution transmission electron microscopy (TEM).

• Research Organization: Los Alamos National Laboratory
• Sponsoring Organization: DOE
• OSTI ID: 975266
• Report Number(s): LA-UR-01-1392
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ABSORPTION SPECTROSCOPY
ATOMIC FORCE MICROSCOPY
ELECTRON DIFFRACTION
MICROBALANCES
MOLECULAR BEAM EPITAXY
MONITORS
OXIDES
QUARTZ
REFLECTION
SUPERLATTICES
TRANSMISSION ELECTRON MICROSCOPY
X-RAY DIFFRACTION