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Abrupt PbTiO{sub 3}/SrTiO{sub 3} superlattices grown by reactive molecular beam epitaxy

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.124035· OSTI ID:338660
; ;  [1]; ;  [2]
  1. Department of Materials Science and Engineering, The University of Michigan, Ann Arbor, Michigan 48109-2136 (United States)
  2. Department of Materials Science and Engineering, Penn State University, University Park, Pennsylvania 16802-5005 (United States)

PbTiO{sub 3}/SrTiO{sub 3} superlattices were grown on (001) SrTiO{sub 3} substrates by reactive molecular beam epitaxy (MBE). Sharp superlattice reflections were observed by x-ray diffraction. High-resolution transmission electron microscopy of a [(PbTiO{sub 3}){sub 10}/(SrTiO{sub 3}){sub 10}]{sub 15} superlattice revealed that the PbTiO{sub 3}/SrTiO{sub 3} interface structure is atomically sharp. The superlattice interfaces are fully coherent; no misfit dislocations or other crystal defects were observed in the superlattice by transmission electron microscopy. Selected area electron diffraction patterns indicated that the PbTiO{sub 3} layers are oriented with the {ital c} axis parallel to the growth direction. The dimensional control and interface abruptness achieved in this model system indicate that MBE is a viable method for constructing oxide multilayers on a scale where enhanced dielectric effects are expected. {copyright} {ital 1999 American Institute of Physics.}

OSTI ID:
338660
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 19 Vol. 74; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English