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H enhancement of N vacancy migration in GaN.

Journal Article · · Proposed for publication in Applied Physics Letters.
DOI:https://doi.org/10.1063/1.2130389· OSTI ID:973647

We have used density functional theory to investigate diffusion of V{sub N}{sup +} in the presence of H{sup +}. Optimal migration pathways were determined using the climbing image nudged elastic band and directed dimer methods. Our calculations indicate that the rate-limiting barrier for VN{sub N}{sup +} migration will be reduced by 0.58 eV by interplay with H{sup +}, which will enhance migration by more than an order of magnitude at typical GaN growth temperatures.

Research Organization:
Sandia National Laboratories
Sponsoring Organization:
USDOE
DOE Contract Number:
AC04-94AL85000
OSTI ID:
973647
Report Number(s):
SAND2005-4265J
Journal Information:
Proposed for publication in Applied Physics Letters., Journal Name: Proposed for publication in Applied Physics Letters. Journal Issue: 20 Vol. 87; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English

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