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Title: In situ synchrotron x-ray studies of strain and composition evolution during metal-organic chemical vapor deposition of InGaN.

Journal Article · · Appl. Phys. Lett.
DOI:https://doi.org/10.1063/1.3293441· OSTI ID:972191

Composition and strain inhomogeneities strongly affect the optoelectronic properties of InGaN but their origin has been unclear. Here we report real-time x-ray reciprocal space mapping that reveals the development of strain and composition distributions during metal-organic chemical vapor deposition of In{sub x}Ga{sub 1-x}N on GaN. Strong, correlated inhomogeneities of the strain state and In fraction x arise during growth in a manner consistent with models for instabilities driven by strain relaxation.

Research Organization:
Argonne National Lab. (ANL), Argonne, IL (United States)
Sponsoring Organization:
USDOE Office of Science (SC)
DOE Contract Number:
DE-AC02-06CH11357
OSTI ID:
972191
Report Number(s):
ANL/MSD/JA-65838; APPLAB; TRN: US1001976
Journal Information:
Appl. Phys. Lett., Vol. 96, Issue 2010; ISSN 0003-6951
Country of Publication:
United States
Language:
ENGLISH