A microstitching interferometer for evaluating the surface profile of precisely figured hard x-ray K-B mirrors.

Conference · Mon Jan 01 04:00:00 EST 2007

DOI:https://doi.org/10.1117/12.736384· OSTI ID:970794

Assoufid, L; Qian, J; Kewish, C M; Liu, C; Conley, R; Macrander, A T; Lindley, D; Saxer, C; KLA-Tencor,

Fabrication and evaluation of elliptical X-ray mirrors, such as Kirkpatrick-Baez (K-B) mirrors produced by the profile-coating technique, requires accurate surface figure measurements over a wide range of spatial frequencies. Microstitching interferometry has proven to fulfill this requirement for length scales from a few {micro}m up to the full mirror length. At the Advanced Photon Source, a state-of-the-art microroughness microscope interferometer that incorporates advanced microstitching capability has been used to obtain measurements of profile-coated elliptical K-B mirrors. The stitched surface height data provide previously unattainable resolution and reproducibility, which has facilitated the fabrication of ultrasmooth (< 1 nm rms residual height) profile-coated mirrors, whose hard X-ray focusing performance is expected to approach the diffraction limit. This paper describes the system capabilities and limitations. Results of measurements obtained with it will be discussed and compared with those obtained with the Long Trace Profiler.

• Research Organization: Argonne National Laboratory (ANL)
• Sponsoring Organization: SC
• DOE Contract Number: AC02-06CH11357
• OSTI ID: 970794
• Report Number(s): ANL/XSD/CP-60273
• Country of Publication: United States
• Language: ENGLISH

Related Subjects

43 PARTICLE ACCELERATORS
ADVANCED PHOTON SOURCE
DIFFRACTION
EVALUATION
FABRICATION
FOCUSING
HARD X RADIATION
INTERFEROMETERS
INTERFEROMETRY
MICROSCOPES
MIRRORS
OPTICS
PERFORMANCE
RESOLUTION