Thin Film Femtosecond Laser Damage Competition

Conference · Sat Nov 14 04:00:00 EST 2009

DOI:https://doi.org/10.1117/12.837473· OSTI ID:970163

Stolz, C J; Ristau, D; Turowski, M; Blaschke, H

In order to determine the current status of thin film laser resistance within the private, academic, and government sectors, a damage competition was started at the 2008 Boulder Damage Symposium. This damage competition allows a direct comparison of the current state of the art of high laser resistance coatings since they are tested using the same damage test setup and the same protocol. In 2009 a high reflector coating was selected at a wavelength of 786 nm at normal incidence at a pulse length of 180 femtoseconds. A double blind test assured sample and submitter anonymity so only a summary of the results are presented here. In addition to the laser resistance results, details of deposition processes, coating materials and layer count, and spectral results will also be shared.

• Research Organization: Lawrence Livermore National Laboratory (LLNL), Livermore, CA
• Sponsoring Organization: USDOE
• DOE Contract Number: W-7405-ENG-48
• OSTI ID: 970163
• Report Number(s): LLNL-PROC-420505
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
COATINGS
DEPOSITION
LASERS
THIN FILMS
WAVELENGTHS