355-nm, nanosecond laser mirror thin film damage competition

Journal Article · Thu Nov 23 00:00:00 EST 2017 · SPIE Proceedings

DOI:https://doi.org/10.1117/12.2279981· OSTI ID:1424107

Negres, Raluca A. ^[1]; Stolz, Christopher J. ^[1]; Thomas, Michael D. ^[2]; Caputo, Mark ^[2]

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1. Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
2. Spica Technologies, Inc., Hollis, NH (United States)

Here, this competition aimed to survey state-of-the-art UV high reflectors. The requirements of the coatings are a minimum reflection of 99.5% at 45 degrees incidence angle for P-polarized light at 355-nm. The choice of coating materials, design, and deposition method were left to the participants. Laser damage testing was performed at a single testing facility using the raster scan method with a 5-ns pulse length laser system operating at 10 Hz in a single longitudinal mode. A double blind test assured sample and submitter anonymity. Finally, in addition to the laser damage resistance results, details of the deposition processes, cleaning method, coating materials and layer count are also shared.

• Research Organization: Lawrence Livermore National Lab. (LLNL), Livermore, CA (United States)
• Sponsoring Organization: USDOE
• Grant/Contract Number: AC52-07NA27344
• OSTI ID: 1424107
• Report Number(s): LLNL-JRNL--742147
• Journal Information: SPIE Proceedings, Journal Name: SPIE Proceedings Vol. 10447
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
42 ENGINEERING
71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
UV reflector
dielectric coating
laser damage resistance
laser damage testing
multilayer
nanosecond pulse length
thin film