Fabrication of epitaxial γ-Al2O3 and spinel NiAl2O4 films on SrTiO3 by Pulsed Laser Ablation
Journal Article
·
· Journal of Crystal Growth
- ORNL
Spinel -Al2O3 and NiAl2O4 thin films were grown on (001) SrTiO3 substrates by pulsed laser deposition. The high quality of epitaxial growth and cube-on-cube orientation of the films were confirmed by x-ray diffraction and transmission electron microscopy. The growth of NiAl2O4 thin films is related to the reaction between sequentially deposited -Al2O3 and NiO layers. These films were grown using a unique multi-target approach.
- Research Organization:
- Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). Shared Research Equipment Collaborative Research Center
- Sponsoring Organization:
- USDOE Laboratory Directed Research and Development (LDRD) Program
- DOE Contract Number:
- DE-AC05-00OR22725
- OSTI ID:
- 959438
- Journal Information:
- Journal of Crystal Growth, Vol. 311, Issue 1; ISSN 0022-0248
- Country of Publication:
- United States
- Language:
- English
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