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Fabrication of epitaxial γ-Al2O3 and spinel NiAl2O4 films on SrTiO3 by Pulsed Laser Ablation

Journal Article · · Journal of Crystal Growth
Spinel -Al2O3 and NiAl2O4 thin films were grown on (001) SrTiO3 substrates by pulsed laser deposition. The high quality of epitaxial growth and cube-on-cube orientation of the films were confirmed by x-ray diffraction and transmission electron microscopy. The growth of NiAl2O4 thin films is related to the reaction between sequentially deposited -Al2O3 and NiO layers. These films were grown using a unique multi-target approach.
Research Organization:
Oak Ridge National Laboratory (ORNL); Shared Research Equipment Collaborative Research Center
Sponsoring Organization:
ORNL LDRD Director's R&D
DOE Contract Number:
AC05-00OR22725
OSTI ID:
959438
Journal Information:
Journal of Crystal Growth, Journal Name: Journal of Crystal Growth Journal Issue: 1 Vol. 311; ISSN 0022-0248; ISSN JCRGAE
Country of Publication:
United States
Language:
English