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Effects of N Incorporation on the Structural and Photoluminescence Characteristics of GaSbN/GaSb Single Quantum Wells

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.2734081· OSTI ID:958775
 [1]
  1. North Carolina A&T State University
The structural and optical properties of GaSbN single quantum wells grown on GaSb substrates by solid source molecular beam epitaxy have been investigated for N concentrations up to 1.5%. The presence of well resolved and pronounced Pendellosung fringes, dynamical diffraction rods seen in the corresponding reciprocal space map, and triple axis full width at half maximum of 10-11 arcsec of the substrate and epilayer peak indicates epilayers of excellent quality with smooth interfaces. Low temperature photoluminescence (PL) exhibited sharp and discrete N related PL line features below the GaSb band edge. Their dependence on N concentration as well as measurement temperature and excitation intensity of the PL strongly suggests that these lines correspond to highly localized N pair/cluster states. No significant effect of in-situ annealing in Sb ambient on the PL features was observed, while ex-situ annealing in N ambient led to the annihilation of these features.
Research Organization:
Oak Ridge National Laboratory (ORNL); Center for Nanophase Materials Sciences
Sponsoring Organization:
SC USDOE - Office of Science (SC)
DOE Contract Number:
AC05-00OR22725
OSTI ID:
958775
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 101; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English