MOCVD OF YSZ COATINGS USING ?-DIKETONATE PRECURSORS

Journal Article · Thu Jan 01 00:00:00 EST 2009 · Journal of Alloys and Compounds

DOI:https://doi.org/10.1016/j.jallcom.2008.02.103· OSTI ID:947127

Varanasi, Venu G ^[1]; Besmann, Theodore M ^[1]; Hyde, Robin L. ^[2]; Payzant, E Andrew ^[1]; Anderson, Timothy J ^[3]

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1. ORNL
2. Oak Ridge National Laboratory (ORNL)
3. University of Florida

Metallorganic chemical vapor deposition (MOCVD) was used to fabricate yttria-stabilized zirconia as a thermal barrier coating. The MOCVD precursors were Y(tmhd)3 and Zr(tmhd)4 (tmhd = 2, 2, 6, 6-tetramethyl-3, 5-heptanedianato) and delivered via aerosol assisted liquid delivery (AALD). The maximum tetragonal YSZ coating rate was 14.2 1.3 m h -1 (at 845oC) yielding a layered coating microstructure. The growth was first-order with temperature (T < 827oC) with an apparent activation energy (Ea) of 50.9 4.3 kJ mol -1. Coating efficiency was a maximum of approximately 10% at the highest growth rate.

• Research Organization: Oak Ridge National Lab. (ORNL), Oak Ridge, TN (United States). High Temperature Materials Lab. (HTML)
• Sponsoring Organization: FE USDOE - Office of Fossil Energy (FE)
• DOE Contract Number: DE-AC05-00OR22725
• OSTI ID: 947127
• Journal Information: Journal of Alloys and Compounds, Vol. 470, Issue 1-2; ISSN 0925-8388
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ACTIVATION ENERGY
AEROSOLS
CHEMICAL VAPOR DEPOSITION
COATINGS
EFFICIENCY
MICROSTRUCTURE
THERMAL BARRIERS
TBC
CVD
thermal barrier coating
chemical vapor deposition
yttria-stabilized zirconia