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Characteristics of CoxTi1-xO2 thin films deposited by MOCVD

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.2998971· OSTI ID:943518

This paper deals with the growth and characterization of ferromagnetic cobalt doped TiO{sub 2} thin films deposited by liquid precursor metal organic chemical vapor deposition (MOCVD) using a new combination of the source materials Co(TMHD){sub 3}, tetrahydrofuran (THF), and titanium isopropoxide (TIP). An array of experiments reveals the intrinsic ferromagnetic nature of the grown films, and suggests that the magnetism is not generated by oxygen vacancies.

Research Organization:
Ernest Orlando Lawrence Berkeley National Laboratory, Berkeley, CA (US)
Sponsoring Organization:
Advanced Light Source Division
DOE Contract Number:
AC02-05CH11231
OSTI ID:
943518
Report Number(s):
LBNL-1224E
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English